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Featured researches published by S. Kuiper.


Journal of Membrane Science | 1998

Development and applications of very high flux microfiltration membranes

S. Kuiper; C.J.M. van Rijn; W. Nijdam; Michael Curt Elwenspoek

Inorganic microfiltration membranes with a pore size down to 0.1 ?m have been made using laser interference lithography and silicon micro machining technology. The membranes have an extremely small flow resistance due to a thickness smaller than the pore size, a high porosity and a very narrow pore size distribution. They are relatively insensible to fouling, because they have a smooth surface, short pore channels and because they can be operated in cross flow configuration at very low transmembrane pressures. Experiments with yeast cell filtration of beer show a minimal fouling tendency and a flux that is about 40 times higher than in conventional diatomaceous earth filtration. The uniform pore distribution makes the membranes suitable for many other applications like critical cell to cell separation, particle analysis systems, absolute filtrations and model experiments.


Nanotechnology | 1998

Nanosieves with microsystem technology for microfiltration applications

Cees van Rijn; G.J. Veldhuis; S. Kuiper

A nanosieve with a very uniform pore size of 260 nm and a pore-to-pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micromachining technology. The nanosieve filter consists of a thick silicon nitride membrane perforated with submicron diameter pores and a macroperforated inorganic silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.


Journal of Micromechanics and Microengineering | 1999

Microsieves made with laser interference lithography for micro-filtration applications

Cees van Rijn; Wietze Nijdam; S. Kuiper; G.J. Veldhuis; Henk van Wolferen; M.C. Elwenspoek

A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology. The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.


Journal of Membrane Science | 2002

Filtration of lager beer with microsieves: flux, permeate haze and in-line microscope observations

S. Kuiper; Cees van Rijn; Wietze Nijdam; Onno Raspe; Henk van Wolferen; Gijs J. M. Krijnen; M.C. Elwenspoek

Membrane fouling during filtration of lager beer with microsieves was studied through in-line microscope observations. It was observed that the main fouling was caused by micrometre-sized particles, presumably aggregated proteins. These particles formed flocks covering parts of the membrane surface. Most of the flocks could be removed by a strong temporary increase in crossflow. Underneath the flocks a permanent fouling layer was formed inside the pores. This made frequent removal of the flocks crucial in delaying the process of permanent in-pore fouling. Besides the fouling process the influence of pore size on permeate flux and turbidity was investigated. Centrifuged beer appeared to give a significantly clearer permeate than rough beer. For centrifuged beer and a microsieve with a pore diameter of 0.55 μm a haze of 0.23 EBC was obtained during 10.5 h of filtration at an average flux of 2.21×103 l/m2 h. For a sieve with slit-shaped perforations of 0.70 μm×3.0 μm a haze of 0.46 EBC was obtained during 9 h of filtration at an average flux of 1.43×104 l/m2 h. This flux is more than two-orders of magnitude higher than is commonly obtained with membrane-filtration of lager beer. Concentration of the beer by a factor of 12 hardly influenced the magnitude of the flux.


Journal of Micromechanics and Microengineering | 2001

Fabrication of microsieves with sub-micron pore size by laser interference lithography

S. Kuiper; Henk van Wolferen; Cees van Rijn; Wietze Nijdam; Gijs J. M. Krijnen; M.C. Elwenspoek

Laser interference lithography is a low-cost method for the exposure of large surfaces with regular patterns. Using this method, microsieves with a pore size of 65 nm and a pitch of 200 nm have been fabricated. The pores are formed by inverting a square array of photoresist posts with a chromium lift-off process and by subsequent reactive-ion etching using the chromium as an etch mask. The method has wider process latitude than direct formation of holes in the resist layer and the chromium mask allows for etching of pores with vertical sidewalls.


Journal of Membrane Science | 2002

Ceramic microsieves: influence of perforation shape and distribution on flow resistance and membrane strength

S. Kuiper; R. Brink; W. Nijdam; Gijsbertus J.M. Krijnen; Michael Curt Elwenspoek

Ceramic microsieves with slit-shaped perforations were compared to sieves with circular-shaped perforations, regarding flow resistance and membrane strength. Destructive tests show that the highest strength is obtained if the perforations are placed in a non-alternating pattern. Especially for slits, alternating patterns should be avoided as they make the structure unnecessarily flexible. The highest stress occurs at the edges of the membrane where it is attached to the support. Flexible structures bend stronger and therefore cause a higher stress at the edge, resulting in an easier rupture of the membrane. Our results show that ceramic microsieves with slits show a four to five-fold decrease in flow resistance for comparable strength related to sieves with circular pores.


Journal of Micromechanics and Microengineering | 2000

Wet and dry etching techniques for the release of sub-micrometre perforated membranes

S. Kuiper; Meint J. de Boer; Cees J.M. van Rijn; Wietze Nijdam; Gijs J. M. Krijnen; M.C. Elwenspoek

For the production of microsieves we studied the release of perforated silicon nitride membranes from a silicon substrate. During the release by KOH etching the pressure build-up due to hydrogen gas formation can be quite large and cause rupture of the membrane. We explored the use of anisotropic etching with an SF6/O2 plasma to replace KOH etching. For sub-micrometre pores excellent results were obtained.


Journal of Membrane Science | 2000

Determination of particle-release conditions in microfiltration: a simple single-particle model tested on a model membrane

S. Kuiper; C.J.M. van Rijn; W. Nijdam; Gijsbertus J.M. Krijnen; Michael Curt Elwenspoek

A simple single-particle model was developed for cross-flow microfiltration with microsieves. The model describes the cross-flow conditions required to release a trapped spherical particle from a circular pore. All equations are derived in a fully analytical way without any fitting parameters. For experimental verification of the model ultra-thin microsieves of uniform pore size and distribution were used. The release of trapped particles (polystyrene spheres and yeast cells) was determined by flux measurements as well as by in-line observation through a microscope. The results show that the model gives a fairly good indication of what cross-flow should be applied to keep the pores free for the conditions specified in this paper. In addition it provides us with a simple rule of thumb for the design of cross-flow modules for microsieves. It describes which geometrical demands have to be met to enable filtration without pore blocking, again for the conditions specified in this paper.


Proceedings of the 3rd symposium on Microsystems in practice | 2000

Microsieves: influence of perforations on flow resistance and membrane strength

S. Kuiper; R. Brink; C.J.M. van Rijn; W. Nijdam; Gijsbertus J.M. Krijnen; Michael Curt Elwenspoek


Optics Communications | 1999

Wet and dry etching techniques for the release of submicron perforated membranes

S. Kuiper; Boer de Meint; Rijn van Cees; Wietze Nijdam; Gijs J. M. Krijnen; M.C. Elwenspoek

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M.C. Elwenspoek

MESA+ Institute for Nanotechnology

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Gijsbertus J.M. Krijnen

MESA+ Institute for Nanotechnology

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