S. O. Usov

Analysis of the local indium composition in ultrathin InGaN layers

Experimental photoluminescence (PL) spectra and structural properties of the ultrathin InGaN insertions in an AlGaN matrix grown on a sapphire substrate were investigated. The PL emission mechanism was shown to be governed by the quantum dot (QD)-like indium-rich areas with size about 3 nm, which was determined from high resolution transmission electron microscopy image analysis. The local indium composition in QDs of the samples was estimated as about 26% using the suggested model of PL transition energy, which accounts for quantum confinement energy, spontaneous and piezoelectric fields.

Dependence of the efficiency of III-N blue LEDs on the structural perfection of GaN epitaxial buffer layers

III-N blue LED structures with active regions based on InGaN nanoislands are studied. The structures are grown by metalorganic vapor-phase epitaxy (MOVPE) on GaN layers deposited by various methods for the initial formation of an epitaxial layer. It is shown that, due to strong carrier localization in narrow-gap InGaN nanoislands, the electroluminescence efficiency is independent of the crystal perfection of the material.

Influence of hydrogen on local phase separation in InGaN thin layers and properties of light-emitting structures based on them

Results of studies of hydrogen addition during the growth of thin (∼2–3 nm) InGaN layers on their structural properties and properties of light-emitting structures that contain InGaN/GaN heterostructures in the active region are reported. It is shown that, with the known effect of a decrease in the average content of In, hydrogen addition leads to varying the local phase separation in the InGaN layers. Hydrogen addition during the growth of the InGaN layers initially causes suppression of the local phase separation, while hydrogen addition during interruptions of the growth after deposition of the InGaN films leads to a decrease in the size of the formed local In-enriched regions and to a certain increase in the local content of the In atoms.

Effect of the design of the active region of monolithic multi-color LED heterostructures on their spectra and emission efficiency

The design features of light-emitting-diode heterostructures with a monolithic InGaN/GaN active region containing several InGaN quantum wells (QWs) emitting at different wavelengths, grown by metal-organic chemical vapor deposition, are studied. It is shown that the number of emission bands can be raised to three by increasing the number of deposited InGaN QWs with different indium contents. The emission efficiency decreases by approximately 30% with increasing number of QWs at high currents. The dependences of the optical properties of the heterostructures on the number of QWs and types of barriers between the QWs (GaN layer or InGaN/GaN short-period superlattice) are analyzed. It is demonstrated that the ratio between the intensities of the emission lines widely varies with current flowing through the structure and greatly depends on the type and width of the barriers between the QWs.

Composite InGaN/GaN/InAlN heterostructures emitting in the yellow-red spectral region

The results of studies of the properties of composite InGaN/GaN/InAlN heterostructures are reported. It is shown that, in the InAlN layer, there is substantial phase separation that brings about the formation of three-dimensional islands consisting of AlN-InAlN-AlN regions. The dimensions of these islands depend on the thickness of the InAlN layer and the conditions of epitaxial growth. Interruptions in the growth of InAlN provide a means for influencing the structural properties of the InAlN islands. The use of composite InGaN/GaN/InAlN heterostructures, in which the InGaN layer with a high In content serves as the active region in light-emitting diode structures, makes it possible to achieve emission in the yellow-red wavelength range 560–620 nm.

InGaN/GaN light-emitting diode microwires of submillimeter length

Microcrystalline wire-like InGaN/GaN light-emitting diodes designed as core–shell structures 400–600 μm in length are grown by metal–organic vapor-phase epitaxy on sapphire and silicon substrates. The technology of the titanium-nanolayer-induced ultrafast growth of nanowire and microwire crystals is used. As a current is passed through the microcrystals, an electroluminescence signal is observed in the blue–green spectral region.

effect of the parameters of AlN/GaN/AlGaN and AlN/GaN/InAlN heterostructures with a two-dimensional electron gas on their electrical properties and the characteristics of transistors on their basis

The effect of the layer thickness and composition in AlGaN/AlN/GaN and InAlN/AlN/GaN transistor heterostructures with a two-dimensional electron gas on their electrical and the static parameters of test transistors fabricated from such heterostructures are experimentally and theoretically studied. It is shown that the use of an InAlN barrier layer instead of AlGaN results in a more than twofold increase in the carrier concentration in the channel, which leads to a corresponding increase in the saturation current. In situ dielectric-coating deposition on the InAlN/AlN/GaN heterostructure surface during growth process allows an increase in the maximum saturation current and breakdown voltages while retaining high transconductance.

InGaN/GaN heterostructures grown by submonolayer deposition

InGaN/(Al,Ga)N heterostructures containing ultrathin InGaN layers, grown by submonolayer deposition are studied. It is shown that significant phase separation with the formation of local In-enriched regions ∼3–4 nm in height and ∼5–8 nm in lateral size is observed in InGaN layers in the case of InGaN and GaN growth by cyclic deposition to effective thicknesses of less than one monolayer. The effect of growth interruption in a hydrogen-containing atmosphere during submonolayer growth on the structural and optical properties of InGaN/(Al,Ga)N heterostructures is studied. It is shown that these interruptions stimulate phase separation. It is also shown that the formation of In-enriched regions can be controlled by varying the effective InGaN and GaN thicknesses in the submonolayer deposition cycles.