S. P. Tobin

Numerical Simulation of Third-Generation HgCdTe Detector Pixel Arrays

In this paper, we present a physics-based full 3-D numerical simulation model of third-generation infrared (IR) detector pixel arrays. The approach avoids geometrical simplifications typical of 1-D and 2-D models that can introduce errors which are difficult to quantify. We have used a finite-difference time-domain technique to compute the optical characteristics including the reflectance and the carrier generation rate in the device. Subsequently, we employ the finite-element method to solve the drift-diffusion equations on a mixed-element grid to compute the electrical characteristics including the I(V) characteristics and quantum efficiency. Furthermore, we have used this model to study HgCdTe two-color detectors that operate in the medium-wave to long-wave IR and photovoltaic pixel arrays employing a photon-trapping structure realized with a periodic array of pillars that operate in the medium-wave IR.

Understanding ion-milling damage in Hg1−xCdxTe epilayers

Transmission electron microscopy (TEM) is widely used for the characterization of the microstructure of Hg1−xCdxTe epilayers. Traditional TEM sample preparation methods, which usually involve argon ion milling, can easily cause damage to the material, and the size and density of the induced defects depend on the milling conditions. In this work, the structural damage caused by argon ion milling of Hg1−xCdxTe epilayers has been investigated. Multilayer samples with different Hg concentrations, as grown by molecular beam epitaxy, and p-n heterojunctions, as grown by liquid-phase epitaxy, have been examined. It is shown that, in addition to the milling conditions, the extent of the ion-induced damage depends sensitively on the Hg concentration of the Hg1−xCdxTe alloy as well as the epilayer growth conditions (i.e., Hg rich or Te rich). A possible mechanism that explains these results is briefly discussed.

AlGaN UV focal plane arrays

This paper presents characterization data, including UV imagery, for 256 x 256 AlGaN UV Focal Plane Arrays (FPAs). The UV-FPAs have 30 x 30 μm 2 unit cells, and use back-illuminated arrays of AlGaN p-i-n photodiodes operating at zero bias voltage. The photodiode arrays were fabricated from multilayer AlGaN films grown by MOCVD on sapphire substrates. Data are also presented for individual AlGaN photodiodes and variable-area diagnostic arrays.

HgCdTe MWIR back-illuminated electron-initiated avalanche photodiode arrays

This paper reports performance data for back-illuminated planar n-on-p HgCdTe electron-initiated avalanche photodiode (e-APD) 4×4 arrays with large-area unit cells (250×250 μm2). The arrays were fabricated from p-type HgCdTe films grown by LPE on CdZnTe substrates. The arrays were bump-mounted to fanout boards and were characterized in the back-illuminated mode. Gain increases exponentially with reverse bias voltage, and gain versus bias curves are quite uniform from element to element. The maximum gain measured is 648 at -11.7 V for a cutoff wavelength of 4.06 μm at 160 K. For the same reverse bias voltage, the gain at 160 K for elements with two different cutoff wavelengths (3.54 and 4.06 μm at 160 K) increases exponentially with increasing cutoff wavelength, in agreement with Becks empirical model for gain versus voltage in HgCdTe e-APDs. Spot scan data show that both the V=0 response and the gain at V=-5.0 V are quite uniform spatially over the large junction area. To the best of our knowledge, these are the first spot scan data for avalanche gain ever reported for HgCdTe e-APDs. Capacitance versus voltage data are consistent with an ideal abrupt junction having a donor concentration equal to the indium counterdoping concentration in the as-grown LPE film. Calculations predict that bandwidths of 500 MHz should be readily achievable in this vertical collection geometry, and that bandwidths as high as 3 GHz may be possible with careful placement of the junction relative to the compositionally interdiffused region between the HgCdTe LPE film and the CdZnTe substrate.

AlGaN p-i-n Photodiode Arrays for Solar-Blind Applications

This paper presents UV imaging results for a 256×256 AlGaN Focal Plane Array that uses a back-illuminated AlGaN heterostructure p-i-n photodiode array, with 30×30 μm 2 unit cells, operating at zero bias voltage, with a narrow-band UV response between 310 and 325 nm. The 256×256 array was fabricated from a multilayer AlGaN film grown by MOCVD on a sapphire substrate. The UV response operability (>0.4×average) was 94.8%, and the UV response uniformity (σ/μ) was 16.8%. Data are also presented for back-illuminated AlGaN p-i-n photodiodes from other films with cutoff wavelengths ranging between 301 and 364 nm. Data for variable-area diagnostic arrays of p-i-n AlGaN photodiodes with a GaN absorber (cutoff=364 nm) show: (1) high external quantum efficiency (50% at V=0 and 62% at V=-9 V); (2) the dark current is proportional to junction area, not perimeter; (3) the forward and reverse currents are uniform (σ/μ=50% for forty 30×30 μm 2 diodes at V=−40 V); (4) the reverse-bias dark current data versus temperature and bias voltage can be fit very well by a hopping conduction model; and (5) capacitance versus voltage data are consistent with nearly full depletion of the unintentionally-doped 0.4 μm thick GaN absorber layer and imply a donor concentration of 3-4×10 16 cm −3 .

VLIWR HgCdTe staring focal plane array development

Atmospheric remote-sensing have been one of the primary drivers toward longer wavelength infrared sensors beyond the 8 to 12 um atmospheric window typically used for terrestrial imaging systems. This paper presents the recent performance improvement attained with very long wavelength infrared (VLWIR) focal plane arrays, by the stringent control of the small bandgap HgCdTe material quality. Array operability is further enhanced by design using a 2:1 super-pixel detector format scheme with programmable bad element de-select and our new detector input offset optimization circuitry within each unit cell. Focal plane arrays with peak quantum efficiencies in excess of 80 percent, and cutoff wavelengths out to 15 μm have NEI operabilities around 95 percent for mid 1014 ph/s-cm2 fluxes operating near 50 K. Average NEI of 3.5 x 1010 ph/s-cm2 was demonstrated for a 14 μm cutoff wavelength focal plane array, consisting of over 55,000 elements, operating with an effective sample time of 87.5 ms.

Predicted performance of HgCdTe photodiodes for 15-25 μm detection

This paper reviews and assesses progress in back-illuminated P-on-n photovoltaic HgCdTe detector technology, grown by two-layer Liquid Phase Epitaxy on CdZnTe substrates, for applications at wavelengths beyond 15 μm in a new generation of spaceborne multispectral instruments for remote sensing. We review data that demonstrate the feasibility of useful cutoff wavelengths as long as 17.5 μm. We recommend that LPE photovoltaic HgCdTe technology be extended to the 20-25 μm wavelength region for single elements and arrays for NASA remote-sensing applications.

HgCdTe Growth on (552) Oriented CdZnTe by Metalorganic Vapor Phase Epitaxy

We report the growth of HgCdTe on (552)B CdZnTe by metalorganic vapor phase epitaxy (MOVPE). The (552) plane is obtained by 180 rotation of the (211) plane about the [111] twist axis. Both are 19.47 degrees from (111), but in opposite directions. HgCdTe grown on the (552)B-oriented CdZnTe has a growth rate similar to the (211)B, but the surface morphology is very different. The (552)B films exhibit no void defects, but do exhibit ∼40 μm size hillocks at densities of 10–50 cm−2. The hillocks, however, are significantly flatter and shorter than those observed on (100) metalorganic vapor phase epitaxy (MOVPE) HgCdTe films. For a 12–14 μm thick film the height of the highest point on the hillock is less than 0.75 μm. No twinning was observed by back-reflection Laue x-ray diffraction for (552)B HgCdTe films and the x-ray double crystal rocking curve widths are comparable to those obtained on (211)B films grown side-by-side and with similar alloy composition. Etch pit density (EPD) measurements show EPD values in the range of (0.6–5)×105 cm−2, again very similar to those currently observed in (211)B MOVPE HgCdTe. The transport properties and ease of dopant incorporation and activation are all comparable to those obtained in (211)B HgCdTe. Mid-wave infrared (MWIR) photodiode detector arrays were fabricated on (552)B HgCdTe films grown in the P-n-N device configuration (upper case denotes layers with wider bandgaps). Radiometric characterization at T=120–160 K show that the detectors have classical spectral response with a cutoff wavelength of 5.22 μm at 120 K, quantum efficiency ∼78%, and diffusion current is the dominant dark current mechanism near zero bias voltage. Overall, the results suggest that (552)B may be the preferred orientation for MOVPE growth of HgCdTe on CdZnTe to achieve improved operability in focal plane arrays.

HgCdTe LWIR p-on-n photodiodes formed by arsenic diffusion from the vapor phase

We report current-voltage data for back-illuminated mesa photodiode test structures fabricated by arsenic-diffusion into n-type LPE HgCdTe films. Arsenic diffusion was carried out in a sealed quartz ampoule containing a source of both Hg and As. The arsenic-diffused p-on-n photodiodes were characterized at 70 K and 80 K. The cutoff wavelength was about 11 μm at 80 K. The data for 400 μm diameter photodiodes fabricated by the arsenic diffusion process are very similar to those from a conventional two-layer LPE P-on-n process for material with approximately the same cutoff wavelength. We outline process and doping level changes that should improve detector performance.

SWIR HgCdTe 256x256 focal plane array technology at BAE Systems

This paper reports new performance data for SWIR HgCdTe 256x256 hybrid Focal Plane Arrays with cutoff wavelengths of 2.6-2.7 μm, operating at temperatures of 190 K to 220 K. The unit cell size is 30x30 μm2. Back-illuminated SWIR HgCdTe P-on-n photodiode arrays were fabricated from two-layer LPE films grown on CdZnTe substrates. Response uniformity is excellent, with σ/μ=3-4%, and response operabilities are better than 99.9%. At a temperature of 190 K and a background photon flux of 6.8x1011 ph/cm2-s, the median NEI is 1.1x109 ph/cm2-s, which is 1.4 times the BLIP NEI. NEI operabilities are better than 98.8%. Quantum efficiencies for large-area test diodes are 69% to 78%, close to the 79% upper limit imposed by reflection from the non-antireflection-coated CdZnTe substrate.