Sangya Jain
Celanese
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Publication
Featured researches published by Sangya Jain.
Advances in Resist Technology and Processing IX | 1992
William R. Brunsvold; Nicholas K. Eib; Christopher F. Lyons; Steve Seiichi Miura; Marina V. Plat; Ralph R. Dammel; O. B. Evans; M. Dalil Rahman; Dinesh N. Khanna; Sangya Jain; Ping-Hung Lu; Stanley A. Ficner
The use of i-line lithography for the 16 to 64 Mbit DRAM device generations calls for increased performance of i-line resists. This paper reports on investigations on novel sensitizers for advanced i-line lithography, starting out with a discussion of general design criteria, then discussing methodology and results of a screening phase, and examining in greater detail a small number of selected candidates for which resolution, exposure latitude, and depth-of-focus data were obtained. Finally, a new advanced resist for i-line lithography, AZR 7500, is presented, and its performance is evaluated in terms of the above criteria as well as thermal flow resistance.
Archive | 1990
Donald Mammato; Sangya Jain; Dana Durham; A Mark; Douglas A. Usifer; Michael J. McFarland
Archive | 1986
A Mark; Dana Durham; Donald Mammato; Sangya Jain
Archive | 1988
A Mark; Donald Mammato; Dana Durham; Sangya Jain
Archive | 1991
A Mark; Donald Mammato; Dana Durham; Sangya Jain
Archive | 1985
Michael G. Kelly; Donald Mammato; Dana Durham; Sangya Jain; Lawrence Crane
Archive | 1990
Sangya Jain; Dinesh N. Khanna; Robert E. Potvin
Archive | 1988
Sangya Jain
Archive | 1992
A Mark; Donald Mammato; Dana Durham; Sangya Jain
Archive | 1989
Sangya Jain; Salvatore Emmi; Thomas S. Phillips
