Sarav B. Jhaveri

Chain-End Functionalized Nanopatterned Polymer Brushes Grown via in Situ Nitroxide Free Radical Exchange

The patterning of biologically active materials has been accomplished by the use of imprint lithography of functional photopolymer resins to create controlled nanoscale patterns of a cross-linked photopolymer containing embedded initiator groups. Functionalized polymer brushes consisting of polystyrene and poly(N,N-dimethylacrylamide) were grown from these patterned layers by nitroxide-mediated polymerization. Chain-end functionalization of the brush layer was accomplished by nitroxide radical exchange during the polymerization. Accordingly, brush layers terminated by pyrene and biotin functional groups were obtained by exchange with the appropriate alkoxyamines. The presence of pyrene functionality at the chain ends of the brushes was confirmed by fluorescent emission measurements. Fluorescently labeled streptavidin protein was selectively attached with high selectivity to the patterned biotinylated brush layer through biotin-streptavidin interactions. The functionalized polymer grafted surfaces and nanopatterns have been successfully characterized using a fluorescence spectrophotometer, AFM, SEM, confocal microscopy, and water contact angle measurements.

Patterned Polymer Films via Reactive Silane Infusion-Induced Wrinkling

A method for simultaneously patterning and functionalizing thin poly(2-hydroxyethyl methacrylate) films through a reactive silane infusion based wrinkling is developed. Wrinkled patterns with tunable wavelengths on submicrometer size are easily produced over large area surfaces and can express a wide variety of chemical functional groups on the surface. The characteristic wavelength of wrinkling scales linearly with initial film thickness, in agreement with a gradationally swollen film model. Results from X-ray photoelectron spectroscopy confirm that the wrinkled film is composed of two layers: a gradient cross-linked top layer and a uniform un-cross-linked bottom layer. The surface chemical properties of wrinkles can be easily tuned by infusion of different functional silanes. Hierarchical wrinkled patterns with micro/nano structure can be achieved by combining wrinkling with other simple lithography methods. Wrinkled nanopatterns can be used as a mold to transfer the topology to a variety of other materials using nanoimprint lithography.

Nickel-catalyzed coupling of aryl bromides in the presence of alkyllithium reagents.

Transition-metal-catalyzed coupling reactions of halogenated molecules leading to formation of new carbon–carbon bonds are a very important category of reactions used in the synthesis of complex compounds and conjugated polymers. Within the past decade, this methodology has evolved into a powerful synthetic tool for the preparation of a wide range of specialty polymers, composite materials, and pharmaceutically active compounds both in the laboratory and on the industrial scale. It is also widely appreciated in the context of parallel synthesis and combinational chemistry. We desired to develop an improved catalytic method for transition-metal-catalyzed aryl coupling reactions and report herein the one-pot, one-step, nickel-catalyzed coupling of aryl bromides in the presence of alkyllithium reagents [Eq. (1)].

High-resolution soft lithography of thin film resists enabling nanoscopic pattern transfer

Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resist. The imprinting was enabled by overcoming resist absorption by polydimethylsiloxane (PDMS) through surface treatment with a layer of (heptadecafluoro-1,1,2,2-tetrahydrodecyl)dimethylchlorosilane. Characterization of the composite molds was done by X-ray photoelectron spectroscopy, nanoindentation, and contact angle measurements. PDMS molds treated with fluoroalkylsilane layer were used to imprint into thin films (70-630 nm) of UV curable resins consisting of either polyurethanes or acrylates, replicating with high fidelity features over the surface of wafer substrates. The use of these highly conformal PDMS molds allowed the patterning of functional materials including gold and aluminium by a simple imprint lithographic technique. This is the first report of the use of modified PDMS surfaces in an imprint process that enables the transfer of sub-micron patterns to underlying layers for device structure fabrication. The patterned features were studied with atomic force microscopy, scanning electron microscopy, and optical microscopy.