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Dive into the research topics where Satoshi Kamimura is active.

Publication


Featured researches published by Satoshi Kamimura.


Archive | 2011

Pattern forming method, chemically amplified resist composition, and resist film

Yuichiro Enomoto; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Shinji Taruya; 聡 上村; 啓太 加藤; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷


Archive | 2009

RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT, PATTERING METHOD USING THE SAME, RESIST FILM, AND PATTERN

Satoshi Kamimura; Shinji Taruya; 聡 上村; 晋司 樽谷


Archive | 2010

Pattern forming method, chemical amplification type resist composition and resist film

Yuichiro Enomoto; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Shinji Taruya; 聡 上村; 啓太 加藤; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷


Archive | 2010

Pattern forming method and active ray-sensitive or radiation-sensitive resin composition

Shuji Hirano; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Hidetomo Takahashi; 聡 上村; 啓太 加藤; 薫 岩戸; 修史 平野; 秀知 高橋


Archive | 2011

Active ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition

Toru Dobashi; Yuichiro Enomoto; Kana Fujii; Kaoru Iwato; Satoshi Kamimura; Shohei Kataoka; Keita Kato; Kazuyoshi Mizutani; Shinji Taruya; 聡 上村; 啓太 加藤; 徹 土橋; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷; 一良 水谷; 祥平 片岡; 佳奈 藤井


Archive | 2009

Pattern forming method using developer containing organic solvent, and rinsing solution for use in the same

Satoshi Kamimura; Shinji Taruya; 聡 上村; 晋司 樽谷


Archive | 2011

Pattern forming method and developer used for pattern forming method

Yuichiro Enomoto; Kana Fujii; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Shinji Taruya; 聡 上村; 啓太 加藤; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷; 佳奈 藤井


Archive | 2009

Pattern forming method, and actinic ray-sensitive or radiation-sensitive resin composition

Yuichiro Enomoto; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Shinji Taruya; 聡 上村; 啓太 加藤; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷


Archive | 2010

NEGATIVE PATTERN FORMATION METHOD, COMPOSITION USED IN THE SAME AND RESIST FILM

Yuichiro Enomoto; Satoshi Kamimura; Shinji Taruya; 聡 上村; 雄一郎 榎本; 晋司 樽谷


Archive | 2010

パターン形成方法、化学増幅型レジスト組成物、及び、レジスト膜

Yuichiro Enomoto; Kaoru Iwato; Satoshi Kamimura; Keita Kato; Shinji Taruya; 聡 上村; 啓太 加藤; 薫 岩戸; 雄一郎 榎本; 晋司 樽谷

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