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Schaefer Herbert

Infineon Technologies

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Publication

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Archive | 1999

Verfahren zur Herstellung eines Bipolartransistors und Verfahren zur Herstellung einer integrierten Schaltungsanordnung mit einem solchen Bipolartransistor

Stengl Reinhard; Meister Thomas F; Schaefer Herbert; Franosch Martin; Boeck Josef; Klein Wolfgang

Archive | 2002

Bipolartransistor und Verfahren zu dessen Herstellung

Stengl Reinhard; Meister Thomas F; Schaefer Herbert; Franosch Martin

Archive | 2001

Lateral high voltage semiconductor element used as a DMOS transistor has semiconductor regions on a semiconductor layer of a semiconductor substrate

Nelle Peter; Fischer Hermann; Werner Wolfgang; Schaefer Herbert

Archive | 2004

Verfahren zur Herstellung einer Transistorstruktur

Stengl Reinhard; Meister Thomas; Schaefer Herbert; Boeck Josef; Seck Martin; Lachner Rudolf

Archive | 1998

MANUFACTURE OF CAPACITOR FOR SEMICONDUCTOR DEVICE

Franosch Martin Dipl Phys; Hoenlein Wolfgang; Klose Helmut; Lange Gerrit; Lehmann Volker; Reisinger Hans Dr; Schaefer Herbert; Stengl Reinhard; Wendt Hermann; Widmann Dietrich

Archive | 2005

Speichervorrichtung zur Speicherung elektrischer Ladung und Verfahren zur Herstellung derselben

Reisinger Hans; Stengl Reinhard; Schaefer Herbert

Archive | 2003

Bipolar transistor used as a self-adjusting bipolar transistor comprises an emitter region electrically contacted via an emitter electrode, a base region electrically contacted

Boeck Josef; Franosch Martin; Schaefer Herbert; Stengl Reinhard; Meister Thomas

Archive | 2001

Verfahren zur Herstellung eines Vertikal-Halbleitertransistorbauelements und Vertikal-Halbleitertransistorbauelement

Schulz Thomas; Roesner Wolfgang; Franosch Martin; Schaefer Herbert; Risch Lothar; Aeugle Thomas

Archive | 1999

METHOD FOR PRODUCING A DOPED LAYER IN A PRODUCT MADE OF A SEMI-CONDUCTOR AND RELATED PRODUCT

Reisinger Hans; Lehmann Volker; Gruening Ulrike; Wendt Hermann; Engelhardt Manfred; Stengl Reinhard; Franosch Martin; Schaefer Herbert

Archive | 1997

Verfahren zur Herstellung feiner Strukturen

Schaefer Herbert; Franosch Martin; Stengl Reinhard; Lehmann Volker; Reisinger Hans; Wendt Hermann

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Stengl Reinhard

Infineon Technologies

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Franosch Martin

Siemens

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Boeck Josef

Infineon Technologies

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Lehmann Volker

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Meister Thomas

Infineon Technologies

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Reisinger Hans

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Wendt Hermann

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Lachner Rudolf

Infineon Technologies

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Lange Gerrit

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Meister Thomas F

Infineon Technologies

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