Seung Beom Cho

Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry

Cerium carbonate powder, cerium oxide powder, method for preparing the same, and cmp slurry comprising the same

Cmp slurry and method for polishing semiconductor wafer using the same

Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same

Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same

Method for preparing lithium iron phosphate nanopowder

Adjuvant for Controlling Polishing Selectivity and Chemical Mechanical Polishing Slurry

CATHODE ACTIVE MATERIAL FOR SECONDARY BATTERY, METHOD OF MANUFACTURING THE SAME, AND CATHODE FOR LITHIUM SECONDARY BATTERY INCLUDING THE CATHODE ACTIVE MATERIAL

CATHODE ACTIVE MATERIAL, METHOD FOR PREPARING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME

Method for preparing carbon-coated lithium iron phosphate nanopowder