Seung Hyun Ra
Samsung Electro-Mechanics
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Featured researches published by Seung Hyun Ra.
Solid State Phenomena | 2007
Seung Hyun Ra; Heon Lee
Nano-imprinting technology, currently developing as an alternative technology for photolithography, is mostly dealing with photo resist materials for etching barrier. In other words, the materials imprinted are used as the barriers for wet etching or RIE (reactive ion etching), and then are removed after all. Thus, most materials developed for nano-imprinting technology have relatively low Tg(<100oC), in case of solids or have a low viscosity before curing in order to fill the gap of the stamp. Such materials could not be suitable for the structures that require relatively high temperature process ability, high modulus or high durability. Epoxy is one of candidates that meet such requirements for the structures. However, it has not been reported about imprinting on epoxy materials. In this paper, nano-imprinting technology was developed to fabricate the microstructures. Instead of thermoplastic imprint resin, solid phase epoxy films, which is thermoset polymer, were imprinted with SAM (self assembly monolayer) coated quartz and silicon stamps. Feature size of stamp varies from 150nm to 1 μm and height was 300nm for quartz stamp and 3μm for Si stamp.
Solid State Phenomena | 2007
Kyeong Jae Byeon; Sung Hoon Hong; Ki Yeon Yang; Seung Hyun Ra; Jin Ho Ahn; Heon Lee
Embossing lithography is one of the most promising technologies for mass production of nano-scale structures. To advance the industrialization of embossing lithography, fabrication of low cost, high mechanical strength embossing template is essential. Electroformed Ni template can be used as an embossing template if its poor anti-adhesive property is fixed by proper releasing layer treatment, especially, when it is used with sticky thermoset polymer. In this experiment, quartz master template with 200nm to 2um sized surface protrusions was fabricated and used to emboss the PMMA coated Si wafer. Then the embossed PMMA layer was coated with metal seed layer (Ni) and electroplating of Ni was followed to fabricate Ni template. To apply anti-stiction SAM layer, SiO2 and Si layer was coated on Ni template. With proper anti-stiction treatment of Ni template, sub-micron patterns were successfully transferred to sticky thermoset polymers such as epoxy resin using Ni template without any degradation of anti-adhesive property.
Archive | 2004
Hyo Soon Shin; Seung Hyun Ra; Yong Suk Kim; Hyoung Ho Kim; Ho Sung Choo; Jung Woo Lee
Archive | 2002
Yu Seon Shin; Seung Hyun Ra; Chang Yong Lee
Archive | 2008
Seung Hyun Ra; Kay Hyeok An; Young Hee Lee; Jong Myeon Lee
Archive | 2004
Ho Sung Choo; Seung Hyun Ra; Yong Suk Kim; Jung Woo Lee; Hyo Soon Shin; Hyoung Ho Kim
Archive | 2006
Jeong Bok Kwak; Il Sang Maeng; Seung Hyun Ra
Archive | 2012
Seung Hyun Ra; Young Hak Jeong
Archive | 2006
Jae Choon Cho; Il Sang Maeng; Choon Keun Lee; Seung Hyun Ra
Archive | 2005
Seung Hyun Ra; Kay Hyeok An; Young Hee Lee; Jong Myeon Lee