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Dive into the research topics where Shigeyoshi Nakayama is active.

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Featured researches published by Shigeyoshi Nakayama.


Journal of The Electrochemical Society | 2001

Voltammetric Characterization of Oxide Films Formed on Copper in Air

Shigeyoshi Nakayama; Atsushi Kimura; Masahiro Shibata; Susumu Kuwabata; Toshiyuki Osakai

Oxide layers thermally formed on copper have been studied using double sweep cyclic voltammetry in strongly alkaline electrolytes. It was found that the addition of I M LiOH in an electrolyte (6 M KOH) allowed perfect resolution of cathodic waves due to the reduction of Cu 2 O and CuO. Assignment of the two reduction waves has been achieved with the help of spectrophotometric techniques including X-ray photoelectron spectroscopy and X-ray diffraction; the cathodic wave appearing between -1.3 and -1.5 V (vs. Ag/AgCI) was attributed to the reduction of Cu 2 O, while that appearing at a less negative potential (-1.0 to -1.1 V) was attributed to the reduction of CuO. The electrochemical measurement of samples prepared under several conditions has revealed that CuO is reduced at once to Cu prior to the reduction of Cu 2 O, It was also confirmed that the formation of the oxide films was accelerated by elevating temperature, heightening humidity, and by preimmersion in electrolyte solutions. Water vapor was essential for the formation of CuO at a lower temperature (80°C).


Journal of The Electrochemical Society | 2007

Which Is Easier to Reduce, Cu2O or CuO ?

Shigeyoshi Nakayama; Tokiko Kaji; Masahiro Shibata; Takenori Notoya; Toshiyuki Osakai

Chronopotentiometry (CP) using 0.1 M KCl as the electrolyte has been most frequently used for selective determination of cuprous and cupric oxides (Cu 2 O and CuO) formed on copper surfaces. However, there are conflicting views regarding the order of reduction of the oxides. This study was carried out to settle this problem. Differently prepared samples of Cu-duplex oxide films were partially reduced by means of CP with 0.1 M KCl and then submitted to X-ray diffractometry and also linear sweep voltammetry using a strongly alkaline electrolyte (6 M KOH + 1 M LiOH) in which reduction peaks of Cu 2 O and CuO could be obtained with good separation. The results clearly demonstrated that CuO was first reduced in 0.1 M KCl, followed by the reduction of Cu 2 O. However, the reductions of both oxides were found to occur simultaneously, to a greater or lesser extent, in 0.1 M KCl. It was also revealed that CuO was reduced to metal Cu in one step and that a partially reduced Cu-duplex oxide sample had an expected Cu|Cu 2 O|Cu sandwich structure.


Journal of The Electrochemical Society | 2010

A Mechanism for the Atmospheric Corrosion of Copper Determined by Voltammetry with a Strongly Alkaline Electrolyte

Shigeyoshi Nakayama; Takenori Notoya; Toshiyuki Osakai

A recently developed voltammetric technique using a strongly alkaline electrolyte (6 M KOH + I M LiOH) was successfully applied to clarify a corrosion mechanism of copper under atmospheric conditions. In contrast to conventional potentiometric methods with neutral or weak alkaline electrolytes (e.g., 0.1 M KCl), the developed method could give qualitative and quantitative information about the corrosion products of copper, including oxides (i.e., Cu 2 O and CuO) and hydroxide [Cu(OH) 2 ]. In the presence of water under such atmospheric conditions, Cu(OH) 2 was the initial corrosion product formed on a copper surface. However, the surface Cu(OH) 2 layer did not grow much but dehydrated to become a layer of CuO. The thus-formed CuO layer grew until it became several molecules thick (∼2 nm). For further progress of corrosion, an inner Cu 2 O layer was generated by the proportionation reaction between the CuO layer and the base metal Cu. The inner Cu 2 O layer grew for the subsequent oxidation until the thickness reached a certain value (∼35 nm). For further oxidation, the top CuO layer grew again preferentially over the inner Cu 2 O laver.


Corrosion Reviews | 2011

Cathodic reduction of copper oxides

Yea-Yang Su; Shigeyoshi Nakayama; Toshiyuki Osakai

Abstract The determination of oxide thickness via cathodic reduction was developed in 1936. It is a simple laboratory practice that has the sensitivity and capability to analyze total oxide thickness of both cuprous and cupric oxides within the same run. Unfortunately, contradictory results and misidentification of oxide layers on the copper surface have caused ambiguity in the interpretation of many published results, leading to its incorrect use in industrial applications. This review surveys experimental parameters used by the authors, such as electrolyte composition and concentration, current density, current efficiency, sample history, interfacial impedance, crystalline orientation, and concentration of depolarizer on the cathodic reduction of copper oxides. Ultimately, the goal of the review is to propose solutions by which more precise measurement and correct identification of oxide layers could be derived from this type of experiment.


Electrochimica Acta | 2008

Mechanistic study of the reduction of copper oxides in alkaline solutions by electrochemical impedance spectroscopy

Shigeyoshi Nakayama; Tokiko Kaji; Takenori Notoya; Toshiyuki Osakai


Archive | 2000

Redox system electroless plating method

Keigo Obata; Dong-Hyun Kim; Takao Takeuchi; Seiichiro Nakao; Shinji Inazawa; Ayao Kariya; Masatoshi Majima; Shigeyoshi Nakayama


Archive | 2002

Plating method and plating bath precursor used therefor

Keigo Obata; Dong-Hyun Kim; Takao Takeuchi; Seiichiro Nakao; Shinji Inazawa; Ayao Kariya; Masatoshi Majima; Shigeyoshi Nakayama


Bunseki Kagaku | 2002

On Standardizing to Voltammetric Determination of Cupric and Cuprous Oxides Formed on Copper.

Shigeyoshi Nakayama; Masahiro Shibata; Takenori Notoya; Toshiyuki Osakai


Archive | 2008

Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for polishing surface of the nitride crystalline material

Kazuhiro Kawabata; Shigeyoshi Nakayama; Keiji Ishibashi


Journal of The Electrochemical Society | 2011

Chemical State Analysis of Tin Oxide Films by Voltammetric Reduction

Shigeyoshi Nakayama; Takayasu Sugihara; Junichi Matsumoto; Takenori Notoya; Toshiyuki Osakai

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Masahiro Shibata

Sumitomo Electric Industries

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Shinji Inazawa

Sumitomo Electric Industries

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Dong-Hyun Kim

Sumitomo Electric Industries

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Kazuhiro Kawabata

Sumitomo Electric Industries

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Keigo Obata

Sumitomo Electric Industries

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Keiji Ishibashi

Sumitomo Electric Industries

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Masatoshi Majima

Sumitomo Electric Industries

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Seiichiro Nakao

Sumitomo Electric Industries

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