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Shimizu Tetsuya

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Publication

Featured researches published by Shimizu Tetsuya.

Archive | 2013

SEMICONDUCTOR SUBSTRATE PRODUCT MANUFACTURING METHOD AND ETCHANT

Mizutani Atsushi; Kamimura Tetsuya; Yoshii Akiko; Shimizu Tetsuya

Archive | 2017

Treatment solution, method of cleaning substrate and method of manufacturing semiconductor device

Yoshii Akiko; Muro Naotsugu; Takahashi Satomi; Shimizu Tetsuya; Takahashi Tomonori

Archive | 2017

Method of storing process liquid for semiconductor device, and container filled with process liquid

Muro Naotsugu; Takahashi Satomi; Takahashi Tomonori; Shimizu Tetsuya; Yoshii Akiko

Archive | 2017

精製装置、精製方法、製造装置、薬液の製造方法、容器、及び薬液収容体

Shimizu Tetsuya; 清水 哲也; Kamimura Tetsuya; 上村 哲也

Archive | 2017

PURIFICATION DEVICE, PURIFICATION METHOD, MANUFACTURING DEVICE, METHOD OF MANUFACTURING CHEMICAL LIQUID, CONTAINER, AND CHEMICAL LIQUID HOUSING

Shimizu Tetsuya; 清水 哲也; Kamimura Tetsuya; 上村 哲也

Archive | 2017

DISPOSITIF DE PURIFICATION, PROCÉDÉ DE PURIFICATION, DISPOSITIF DE FABRICATION, PROCÉDÉ DE FABRICATION DE LIQUIDE CHIMIQUE, RÉCIPIENT ET CORPS CONTENANT UN LIQUIDE CHIMIQUE

Shimizu Tetsuya; 清水 哲也; Kamimura Tetsuya; 上村 哲也

Archive | 2017

TREATMENT LIQUID FOR SEMICONDUCTOR PRODUCTION, CONTAINER IN WHICH TREATMENT LIQUID FOR SEMICONDUCTOR PRODUCTION IS CONTAINED, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Shimizu Tetsuya; Kamimura Tetsuya

Archive | 2017

TREATMENT LIQUID, METHOD FOR CLEANING SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Shimizu Tetsuya; Muro Naotsugu; Yoshii Akiko; Takahashi Tomonori; Takahashi Satomi

Archive | 2017

METHOD FOR STORING TREATMENT LIQUID FOR SEMICONDUCTOR DEVICES AND TREATMENT LIQUID-CONTAINING BODY

Muro Naotsugu; Takahashi Satomi; Takahashi Tomonori; Shimizu Tetsuya; Yoshii Akiko

Archive | 2017

Purification apparatus, purification method, production apparatus, method for producing processing liquid, container, processing liquid storage body

Shimizu Tetsuya; Kamimura Tetsuya

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