Shinichi Mizuguchi
Panasonic
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Publication
Featured researches published by Shinichi Mizuguchi.
SID Symposium Digest of Technical Papers | 1999
Akifumi Ogiwara; Yasunori Kuratomi; T. Karasawa; Akio Takimoto; Shinichi Mizuguchi
We have developed a new type of PS polarization converting device to realize compact LC projectors using holographic polymer dispersed liquid crystal (H-PDLC) thin films. Our films show diffraction efficiency of 80% or more for incoming P-polarized light, transmittance of 95% or more for incoming S-pdarized light.
Review of Scientific Instruments | 1995
Yoshikazu Yoshida; Yasunao Okazaki; Katsuyuki Ito; Shinichi Mizuguchi
Characteristics of a nozzle‐beam‐type microwave radical source are described. This source generates microwave plasma in a space between a nozzle and a skimmer to excite a processing gas. The source has a nozzle of 0.6 mm aperture, followed by a 1.2 mm skimmer, and gases pass through the skimmer so that a molecular beam contains radicals. The total atomic oxygen flux is 1.8×1016 atoms/s at a power of 130 W and an O2 flow rate of 2 SCCM. It is possible to optimize the beam profile by varying the combination of the nozzle and the skimmer. Thus, a high‐density radical source with a compact structure and low power consumption is realized. This source is promising for oxide film growth in an ultrahigh vacuum processing.
Review of Scientific Instruments | 1995
Yoshikazu Yoshida; Katsuyuki Ito; Yasunao Okazaki; Tsuneo Mitsuyu; Shinichi Mizuguchi
Characteristics and application of a nozzle‐beam‐type microwave radical source are described. This source generates microwave plasma in a space between a nozzle and a skimmer for exciting a processing gas. Long‐lived metastable nitrogen molecules effective for film growth processes are observed clearly in this source. p‐type doping of ZnSe films was achieved by employing this source with N2 plasma which was installed in a molecular‐beam epitaxy system. A net acceptor concentration of 5.4×1017 cm−3 was obtained by C–V measurements with lower microwave power of 50 W and lower gas flow of 0.06 sccm compared to conventional rf plasma sources.
Journal of Magnetism and Magnetic Materials | 1993
Noritsugu Umehara; Shinichi Mizuguchi; Koji Kato; S. Nakamara
Abstract A new microsurface finishing method of local area using magnetic fluid, abrasive grains and magnet is proposed. The profile of grinding surface of borosilicate glass is observed as a function of grinding time and magnetic fluid strength. Magnetic fluid and magnetic field can provide efficient and uniform finishing in a local area.
Laser interaction and related plasma phenomena: 12th international conference | 2008
Yukio Nishikawa; Yoshikazu Yoshida; Shinichi Mizuguchi
We have studied the structural change of targets and the ablated particles to classify the characteristics of laser ablation. Neutral atoms, positive ions and global particles are generated from metal targets irradiated by the KrF excimer laser beam. The average energy of 100∼180 eV per atom is required to ablate atomic particles. The targets after irradiation show the change of surface morphologies and X‐ray diffraction patterns due to heating. The change of chemical compositions and the resolidified layer are not observed.
Archive | 1997
Teruhiro Shiono; Michihito Ueda; Tatsuo Ito; Kazuo Yokoyama; Shinichi Mizuguchi
Archive | 1995
Teruhiro Shiono; Michihito Ueda; Tatsuo Ito; Kazuo Yokoyama; Shinichi Mizuguchi
Archive | 1995
Toru Kawase; Yoshinobu Nagano; Tadashi Kimura; Yoshikazu Yoshida; Shinichi Mizuguchi
Archive | 1990
Takahiro Asano; Shinichi Mizuguchi; Toshio Ishikawa
Archive | 1994
Yoshikazu Yoshida; Shinichi Mizuguchi