Shinobu Sugimura
Toshiba
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Publication
Featured researches published by Shinobu Sugimura.
Japanese Journal of Applied Physics | 2010
Tsutomu Nakanishi; Toshiro Hiraoka; Akira Fujimoto; Takeshi Okino; Shinobu Sugimura; Takuya Shimada; Koji Asakawa
A moth-eye structure, which suppresses the reflection on a surface, was fabricated on the entire surface of a large silicon wafer by the formation of a self-assembled particle monolayer as a dry-etch mask formed by our embedded particle monolayer (EPM) method. We optimized the shape of moth-eye structures by optical calculation and improved the fabrication procedure to allow formation over a large area. As a result, we succeeded in fabricating a moth-eye structure on the entire surface of a 12-in. silicon wafer and the surface reflectance was reduced to less than 0.8% in the visible light range. A large nickel mold, which is able to transfer the pattern to an 8-in. display, could be formed using the 12-in. silicon substrate as a master. A moth-eye film was fabricated by UV nanoimprinting using the nickel mold and the high antireflection performance was confirmed. The fabrication cost of the moth-eye structure over a large area would be markedly reduced by the use of the self-assembly technique in combination with nanoimprinting.
Proceedings of SPIE | 2017
Seiji Morita; Ryuichi Saito; Ryosuke Yamamoto; Norikatsu Sasao; Tomoaki Sawabe; Koji Asakawa; Shinobu Sugimura
One of technical issues of directed self-assembly lithography is extremely narrow patterning range. It is really difficult to make not only smaller patterns (pitch of less than 30nm) because of self-assembling limit but also middle patterns (pitch of more than 60nm) because of material synthesis issues. This paper describes wide–range directed self-assembly lithography which enables not only narrow patterns but also wide patterns using newly developed block copolymer. One block of the new block copolymer is easily metalized selectively by metalize technology and it is confirmed that dry etching resistance is markedly improved.
Proceedings of SPIE | 2016
Seiji Morita; Masahiro Kanno; Ryousuke Yamamoto; Norikatsu Sasao; Shinobu Sugimura
In next generation lithography to make sub-15nm pattern, Directed self-assembly (DSA) and Nano-imprint lithography (NIL) are proposed. The current DSA process is complicated and it is difficult to decrease width and line edge roughness of a guide pattern for sub-15nm patterning. In the case of NIL, it is difficult to make the master template having sub- 15nm pattern. This paper describes cost-effective lithography process for making sub-15nm pattern using DSA on a guide pattern replicated by Nano-imprinting (NIL + DSA). Simple process for making sub-15nm pattern is proposed. The quartz templates are made and line/space patterns of half pitch (hp) 12nm and hp9.5nm are obtained by NIL + DSA.
Archive | 2006
Yoshiyuki Kamata; Masatoshi Sakurai; Shinobu Sugimura; Satoshi Shirotori
Archive | 2001
Takuya Shimada; Shinobu Sugimura; Yoshiyuki Kamata; Masatoshi Sakurai
Archive | 2006
Takeshi Okino; Seiji Morita; Masatoshi Sakurai; Shinobu Sugimura
Archive | 2008
Tsutomu Nakanishi; Akira Fujimoto; Koji Asakawa; Takeshi Okino; Shinobu Sugimura
Archive | 2005
Yoshiyuki Kamata; Masatoshi Sakurai; Satoshi Shiratori; Shinobu Sugimura; 忍 杉村; 正敏 櫻井; 聡志 白鳥; 芳幸 鎌田
Archive | 2009
Akiko Yuzawa; Seiji Morita; Shinobu Sugimura; Masatoshi Sakurai
Archive | 2008
Kouji Asakawa; Akira Fujimoto; Tsutomu Nakanishi; Takashi Okino; Shinobu Sugimura