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The Japan Society of Applied Physics | 2007

Large Grain Poly-crystalline Si Films by Carbon Dioxide Laser Assisted SLG Method

Hiroshi Tsunazawa; Yoshihiro Taniguchi; Shinya Okazaki; Masanori Seki; Yasuhito Otsuka; Hiroaki Takeuchi; Masaya Okamoto; Junichiro Nakayama

0 1 2 Relative CDL energy density LG L( μm ) 2. Concept of CDL assisted SLG crystallization The scheme of CDL assisted SLG crystallization is shown in Figure 1. A CDL (a wavelength of 10.6um) module is added on to the XeCl excimer laser anneal system for SLG. The excimer laser is absorbed by an a-Si film; meanwhile, the CDL penetrates the a-Si film and is absorbed by a base coat layer. The base coat layer is heated with the CDL irradiation. On this heated condition, SLG crystallization, that is the excimer laser irradiation through a mask slit, is occurred. Then the heat flow by the excimer laser irradiation to the substrate is prevented; thereby, the SLG crystal length is expanded compared with the conventional SLG crystallization. 3


Archive | 2004

Crystallized semiconductor device, method for producing same and crystallization apparatus

Tetsuya Inui; Hiroshi Tsunazawa; Shinya Okazaki


Archive | 2003

Method of laser beam maching and laser beam machining apparatus

Junichiro Nakayama; Shinya Okazaki


Archive | 2009

Dye-sensitized solar cell, manufacturing method of dye-sensitized solar cell, and manufacturing device of dye-sensitized solar cell

Masanori Kyoho; Shinya Okazaki; 昌則 享保; 真也 岡崎


Archive | 2004

Crystallized semicoductor thin film manufacturing method and its manufacturing apparatus

Yoshihiro Taniguchi; Hiroshi Tsunazawa; Shinya Okazaki; Tetsuya Inui


Archive | 2011

Semiconductor memory control device and control method

Yasuhiro Matsunaga; 安弘 松永; Shinya Okazaki; 真也 岡崎


Archive | 2003

Method of laser beam machining and laser beam machining apparatus

Junichiro Nakayama; Shinya Okazaki


Archive | 2008

Printing method, printing apparatus, printing plate used in it, and pattern film

Masatoshi Nakagawa; Tsuneo Nakamura; Shinya Okazaki; Hiroaki Takeuchi; 政俊 中川; 恒夫 中村; 真也 岡崎; 博明 竹内


Archive | 2016

PHOTOCATALYST MATERIAL AND METHOD FOR PRODUCING SAME

Shinya Okazaki; Hiroyuki Nishinaka; Masakazu Matsubayashi


Archive | 2014

Matériau de photocatalyseur et procédé pour le produire

岡崎 真也; Shinya Okazaki; 浩之 西中; Hiroyuki Nishinaka; 雅和 松林; Masakazu Matsubayashi

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Tetsuya Inui

National Archives and Records Administration

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