Shiro Kawamura | Researchain

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Featured researches published by Shiro Kawamura.

Archive | 2004

Group iii nitride crystal substrate and its manufacturing method, and group iii nitride semiconductor device

Tatsu Hirota; Shiro Kawamura; Yusuke Mori; Seiji Nakahata; Takatomo Sasaki; Masashi Yoshimura; 成二中畑; 孝友佐々木; 政志吉村; 史朗川村; 龍弘田; 勇介森

Archive | 2004

Method for manufacturing nitride crystal of group iii element, nitride crystal of group iii element obtained by the same, and semiconductor device obtained by using the same

Akihiko Ishibashi; Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; 孝友佐々木; 康夫北岡; 尚峯本; 史朗川村; 勲木戸口; 勇介森; 明彦石橋

Archive | 2004

Production method of group iii nitride substrate, group iii nitride substrate produced thereby, and semiconductor device and production method thereof

Archive | 2003

Semiconductor light emitting element employing group iii metal nitride crystal and process for producing group iii metal nitride crystal

信之 ▲高▼倉; 茂成 ▲高▼見; Junji Ikeda; Tomoya Iwahashi; Shiro Kawamura; Yukihiro Kondo; Yusuke Mori; Takatomo Sasaki; Nobuyuki Takakura; Shigenari Takami; Masaharu Yasuda; 孝友佐々木; 正治安田; 友也岩橋; 史朗川村; 勇介森; 順治池田; 行廣近藤

Archive | 2004

Manufacturing method of group iii nitride crystal substrate and etchant used for the same and, group iii nitride crystal substrate and semiconductor element using the same

Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; 孝友佐々木; 康夫北岡; 尚峯本; 史朗川村; 勲木戸口; 勇介森

Archive | 2004

METHOD OF MANUFACTURING GaN CRYSTAL AND GaN CRYSTAL SUBSTRATE, GaN CRYSTAL AND GaN CRYSTAL SUBSTRATE OBTAINED BY THE METHOD, AND SEMICONDUCTOR DEVICE INCLUDING THE SAME

Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Masanori Morishita; Takatomo Sasaki; 孝友佐々木; 康夫北岡; 尚峯本; 史朗川村; 勲木戸口; 勇介森; 昌紀森下

Archive | 2007

PRODUCTION METHOD OF GROUP III ELEMENT NITRIDE CRYSTAL AND GROUP III ELEMENT NITRIDE CRYSTAL

Takeshi Hatayama; Koichi Hiranaka; Shiro Kawamura; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; Osamu Yamada; 孝友佐々木; 康夫北岡; 修山田; 尚峯本; 史朗川村; 弘一平中; 勇介森; 健畑山

Archive | 2006

HEAT TREATMENT METHOD OF EASILY OXIDIZABLE OR EASILY MOISTURE-ABSORBING SUBSTANCE

Shuhei Higashihara; Koji Hirata; Makoto Iwai; Shiro Kawamura; Yusuke Mori; Takatomo Sasaki; Takanao Shimodaira; Shiro Yamazaki; 孝直下平; 孝友佐々木; 史郎山崎; 真岩井; 史朗川村; 宏治平田; 周平東原; 勇介森

Archive | 2010

Method for producing group iii element nitride crystal, group iii element nitride crystal, substrate for forming semiconductor device and semiconductor device

Archive | 2004

Method for manufacturing nitride single crystal of group iii element, apparatus used for the same, and nitride single crystal of group iii element obtained by the method

Kan Imaide; Yasunori Kai; Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; Masashi Yoshimura; 完今出; 孝友佐々木; 康夫北岡; 政志吉村; 尚峯本; 史朗川村; 勲木戸口; 勇介森; 靖規甲斐

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