Shivashankar Vangala

Probing phonon and electrical anisotropy in black phosphorus for device alignment

Black phosphorus has emerged as a promising two-dimensional semiconductor, which has a unique structure that is anisotropic in-plane. This structural anisotropy translates to some very interesting orientation dependent properties. In this paper we present directional characterization and analysis of the phonon and electrical properties in black phosphorus. Using polarization dependent Raman we show a simple method for estimating orientation. A complementary radially contacted field effect transistor (FET) was fabricated in order to measure orientation dependent electrical properties. Mobility and transconductance followed a sinusoidal like dependence on orientation with a 30% anisotropy. Correlating these results with Raman, we show how Raman methods might be used as a nondestructive technique to orient black phosphorus devices.

Investigation of plasmon resonance tunneling through subwavelength hole arrays in highly doped conductive ZnO films

Experimental results pertaining to plasmon resonance tunneling through a highly conductive zinc oxide (ZnO) layer with subwavelength hole-arrays is investigated in the mid-infrared regime. Gallium-doped ZnO layers are pulsed-laser deposited on a silicon wafer. The ZnO has metallic optical properties with a bulk plasma frequency of 214 THz, which is equivalent to a free space wavelength of 1.4u2009μm. Hole arrays with different periods and hole shapes are fabricated via a standard photolithography process. Resonant mode tunneling characteristics are experimentally studied for different incident angles and compared with surface plasmon theoretical calculations and finite-difference time-domain simulations. Transmission peaks, higher than the baseline predicted by diffraction theory, are observed in each of the samples at wavelengths that correspond to the excitation of surface plasmon modes.

Plasmon resonance and perfect light absorption in subwavelength trench arrays etched in gallium-doped zinc oxide film

Near-perfect light absorption in subwavelength trench arrays etched in highly conductive gallium-doped zinc oxide films was experimentally observed in the mid infrared regime. At wavelengths corresponding to the resonant excitation of surface plasmons, up to 99% of impinging light is efficiently trapped and absorbed in the periodic trenches. Scattering cross sectional calculations reveal that each individual trench acts like a vertical split ring resonator with a broad plasmon resonance spectrum. The coupling of these individual plasmon resonators in the grating structure leads to enhanced photon absorption and significant resonant spectral linewidth narrowing. Ellipsometry measurements taken before and after device fabrication result in different permittivity values for the doped zinc oxide material, indicating that localized annealing occurred during the plasma etching process due to surface heating. Simulations, which incorporate a 50 nm annealed region at the zinc oxide surface, are in a good agreement with the experimental results.

Growth and study of nonlinear optical materials for frequency conversion devices with applications in defence and security

A series of nonlinear materials including GaAs, GaP, and ZnSe have been examined to determine their suitability for non-linear frequency conversion devices (FCD) and more specifically their use as high power, compact and broadly tunable IR and THz sources for defense and security applications. The more mature GaAs was investigated to reveal the causes for the optical losses that restrict achievement of higher conversion efficiency in quasi-phasematched FCD, while the efforts with GaP were oriented in developing simple, cost effective techniques for fabrication of orientation patterned (OP) templates and optimizing the subsequent thick HVPE growth on these templates. Thus, average growth rates of 50- 70 μm/h were achieved in up to 8-hour long experiments. High optical layer quality was achieved by suitable control of the process parameters. The optimal orientation of the pattern was determined and used as essential feedback aiming to improve the template preparation. This led to the production of the first 300-400 μm thick device quality OPGaP. Efforts to suppress the parasitic nucleation during growths with longer duration or to achieve thicker layers by a 2 step growth process were also made. The main challenge with the newer candidate, OPZnSe, was to establish suitable regimes for hydrothermal growth on plain (001) ZnSe seeds grown by chemical vapor deposition. Two different temperature ranges, 330-350 °C and 290-330 °C, were investigated. The mineralized concentration was also manipulated to accelerate the growth in (111) direction and, thus, to improve the growth in (001) direction. The next material in the line is GaN. The traditional HVPE approach will be combined with a growth at low reactor pressure. Growths will be performed in the next sequence: growth on thin GaN layers grown by MOCVD on sapphire wafers, growth on half-patterned GaN templates with different orientations and, finally, growth on OPGaN templates.

Heteroepitaxial growth of OPGaP on OPGaAs for frequency conversion in the IR and THz

For the first time thick orientation-patterned GaP (OPGaP) was repeatedly grown heteroepitaxially on OPGaAs templates as a quasi-phase matched medium for frequency conversion in the mid and longwave IR, and THz regions. The OP templates were fabricated by wafer-bonding and in a MBE-assisted polarity inversion process. Standard low-pressure hydride vapor phase epitaxy (LP-HVPE) was used for one-step growth of up to 400 µm thick device quality OPGaP with excellent domain fidelity. The presented results can be viewed as the missing link between a well-developed technique for preparation of OP templates, using one robust nonlinear optical material (GaAs), and the subsequent thick epitaxial growth on them of another material (GaP). The reason for these efforts is that the second material has some indisputable advantages in point of view of thermal and optical properties but the preparation of native templates encounters challenges, which makes it difficult to obtain high quality homoepitaxial growth at an affordable price. Successful heteroepitaxial growth at such a relatively high lattice mismatch (- 3.6%) in a close to equilibrium growth process such as HVPE is noteworthy, especially when previously reported attempts, for example, growth of OPZnSe on OPGaAs templates at about 10 times smaller lattice mismatch ( + 0.3%) have produced only limited results. Combining the advantages of the two most promising nonlinear materials, GaAs and GaP, is a solution that will accelerate the development of high power, tunable laser sources for the IR and THz region, which are in great demand on the market.

Long-wavelength infrared surface plasmons on Ga-doped ZnO filmsexcited via 2D hole arrays for extraordinary optical transmission

Extraordinary optical transmission (EOT) through highly conductive ZnO films with sub-wavelength hole arrays is investigated in the long-wavelength infrared regime. EOT is facilitated by the excitation of surface plasmon polaritons (SPPs) and can be tuned utilizing the physical structure size such as period. Pulse laser deposited Ga-doped ZnO has been shown to have fluctuations in optical and electrical parameters based on fabrication techniques, providing a complimentary tuning means. The sub-wavelength 2D hole arrays are fabricated in the Ga-doped ZnO films via standard lithography and etching processes. Optical reflection measurements completed with a microscope coupled FTIR system contain absorption resonances that are in agreement with analytical theories for excitation of SPPs on 2D structures. EOT through Ga-doped ZnO is numerically demonstrated at wavelengths where SPPs are excited. This highly conductive ZnO EOT structure may prove useful in novel integrated components such as tunable biosensors or surface plasmon coupling mechanisms.

Development of orientation-patterned GaP grown on foreign substrates for QPM frequency conversion devices

Thick hydride vapor phase epitaxially grown orientation-patterned gallium phosphide (OPGaP) is a leading material for quasi-phase matching (QPM) frequency conversion in the mid- and longwave infrared (IR). This is due to its negligible two-photon absorption (2PA) in the convenient pumping range 1 – 1.7 μm, compared with the 2PA of some traditional QPM materials, such as GaAs. In this paper, we describe homo- and heteroepitaxial growth techniques aimed to produce hundreds of microns thick OPGaP on: 1) OPGaAs templates fabricated using an improved wafer-fusion process; 2) OPGaAs templates fabricated by using a molecular beam epitaxy (MBE) for sublattice polarity inversion, but one with and one without MBE regrowth after the inversion. Some of the advantages of the heteroepitaxial growth of OPGaP on OPGaAs templates include: 1) achieving good domain fidelity as a result of the significantly higher OPGaAs template quality; 2) eliminating the needs of using the poor quality commercially available GaP in the production of thick OPGaP material, and 3) suppression of the additional absorption band between 2 – 4 μm (which is due to incorporation of n-type impurities) and, in general, improvement of the IR transmittance in the entire IR region. Combining the advantages of the two most promising nonlinear materials, GaAs and GaP, will accelerate the development of high power, broadly tunable laser sources in the IR which, in addition, will be offered with higher device quality and at a reasonably lower unit cost.

High extinction ratio terahertz wire-grid polarizers with connecting bridges on quartz substrates.

A terahertz (THz) wire-grid polarizer with metallic bridges on a quartz substrate was simulated, fabricated, and tested. The device functions as a wide-band polarizer to incident THz radiation. In addition, the metallic bridges permit the device to function as a transparent electrode when a DC bias is applied to it. Three design variations of the polarizer with bridges and a polarizer without bridges were studied. Results show the devices with bridges have average s-polarization transmittance of less than -3u2009u2009dB and average extinction ratios of approximately 40 dB across a frequency range of 220-990 GHz and thus are comparable to a polarizer without bridges.

Conformal spray-deposited fluorine-doped tin oxide for mid- and long-wave infrared plasmonics

Nanocrystalline spray-deposited fluorine-doped tin oxide (FTO) was investigated for mid- and long-wave infrared plasmonics. Silicon lamellar gratings were conformally coated with FTO, and the excitation of surface plasmon polaritons (SPP) was investigated via their angle and wavelength-dependent reflectivity. Photon-to-SPP coupling efficiency as a function of grating parameters, and in comparsion to gallium-doped zinc oxide (GZO) gratings, was quantitatively analyzed based on a figure of merit related to the sharpness and depth of the coupling resonance. Conformal spray-deposited FTO would be useful in mid- and long-wave infrared plasmonic channel wave guides.

Homo and heteroepitaxial growth and study of orientation-patterned GaP for nonlinear frequency conversion devices

Frequency conversion in orientation-patterned quasi-phase matched materials is a leading approach for generating tunable mid- and long-wave coherent IR radiation for a wide variety of applications. A number of nonlinear optical materials are currently under intensive investigation. Due to their unique properties, chiefly wide IR transparency and high nonlinear susceptibility, GaAs and GaP are among the most promising. Compared to GaAs, GaP has the advantage of having higher thermal conductivity and significantly lower 2PA in the convenient pumping range of 1– 1.7 μm. HVPE growth of OPGaP, however, has encountered certain challenges: low quality and high price of commercially available GaP wafers; and strong parasitic nucleation during HVPE growth that reduces growth rate and aggravates layer quality, often leading to pattern overgrowth. Lessons learned from growing OPGaAs were not entirely helpful, leaving us to alternative solutions for both homoepitaxial growth and template preparation. We report repeatable one-step HVPE growth of up to 400 μm thick OPGaP with excellent domain fidelity deposited for first time on OPGaAs templates. The templates were prepared by wafer fusion bonding or MBE assisted polarity inversion technique. A close to equilibrium growth at such a large lattice mismatch (-3.6%) is itself noteworthy, especially when previously reported attempts (growth of OPZnSe on OPGaAs templates) at much smaller mismatch (+0.3%) have produced limited results. Combining the advantages of the two most promising materials, GaAs and GaP, is a solution that will accelerate the development of high power, tunable laser sources for the mid- and long-wave IR, and THz region.