Shizuka Tashiro
Kyushu University
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Featured researches published by Shizuka Tashiro.
Applied Catalysis B-environmental | 1994
Hideo Nagata; Taijiro Takakura; Shizuka Tashiro; Masahiro Kishida; Koichi Mizuno; Ikuo Tamori; Katsuhiko Wakabayashi
Abstract The catalytic oxidative decomposition of CFCs containing two carbon atoms was investigated in the presence of hydrocarbons (C 1 –C 4 alkanes) over silica and various acidic metal oxides. It was found that CFC-115 was the most difficult to be decomposed among CFC-113, CFC-114, and CFC-115, and that γ-alumina was the most active catalyst. The CFC-115 conversion over γ-alumina was lower in the presence of methane than in the presence of the other hydrocarbons. In addition, the activities of γ-alumina-supported metal and metal oxide catalysts were investigated for the oxidative decomposition of CFC-115 in the presence of n-butane. Tungsten (VI) oxide and vanadium (V) oxide catalysts exhibited the highest activity.
Journal of Materials Science | 2002
Teruoki Tago; Y. Shibata; Takatoshi Hatsuta; K. Miyajima; Masahiro Kishida; Shizuka Tashiro; Katsuhiko Wakabayashi
Silica (SiO2)-coated rhodium (Rh) nanoparticles were prepared using a water-in-oil microemulsion of polyoxyethylene (15) cetyl ether, cyclohexane and water. SiO2-coated Rh nanoparticles were obtained by hydrolyzing metal alkoxide (tetraethylorthosilicate, TEOS) in the solution containing Rh complex nanoparticles followed by thermal and reduction treatments. In the SiO2-coated Rh nanoparticle, a Rh particle with an average diameter of 4.1 nm was located nearly at the center of each spherical SiO2 particle. The SiO2 layer was approximately 15 nm thick. Since the Rh particle was wholly surrounded by SiO2, the Rh particle of the SiO2-coated Rh nanoparticle exhibited an extremely high thermal stability. Furthermore, the porous structure of the SiO2 layer could be controlled by the hydrolysis conditions of TEOS.
Applied Surface Science | 1997
Hideo Nagata; Shizuka Tashiro; Masahiro Kishida; Koichi Mizuno; Katsuhiko Wakabayashi
The catalytic oxidative decomposition of chloropentafluoroethane (CFC-115) was carried out in the presence of butane with various metal oxides supported on alumina-zirconia. Tungsten(VI) oxide alone had a positive effect on the activity among all the metal oxides. It was concluded that the active sites of the tungsten(VI) oxide catalyst supported on alumina-zirconia might be the acid sites formed by the interaction between tungsten(VI) oxide and tetragonal zirconia. This catalyst was found to be the most active of all the catalysts which have so far been examined, and kept a high activity during the oxidative decomposition of CFC-115 for 25 h.
Studies in Surface Science and Catalysis | 1998
Masahiro Kishida; Kyotaro Onoue; Shizuka Tashiro; Hideo Nagata; Katsuhiko Wakabayashi
In this work, it was found that the surface area of silica-supported rhodium catalysts could be controlled in the range between 60 and 600m2/g by using the preparation method which we have developed using water-in-oil microemulsion. The catalysts with a controlled surface area had the same average size of rhodium particles. By using these catalysts, it was also found that turnover frequencies for CO2 hydrogenation increased linearly with the catalyst surface area.
Journal of the American Ceramic Society | 2002
Teruoki Tago; Takatoshi Hatsuta; Kanta Miyajima; Masahiro Kishida; Shizuka Tashiro; Katsuhiko Wakabayashi
Journal of Nanoparticle Research | 2003
Teruoki Tago; Shizuka Tashiro; Yukiko Hashimoto; Katsuhiko Wakabayashi; Masahiro Kishida
Catalysis Today | 1998
Shizuka Tashiro; Hideo Nagata; Masahiro Kishida; Koichi Mizuno; Katsuhiko Wakabayashi
Journal of The Japan Petroleum Institute | 1994
Hideo Nagata; Taijiro Takakura; Shizuka Tashiro; Masahiro Kishida; Koichi Mizuno; Yukio Tamori; Katsuhiko Wakabayashi
Journal of Nanoparticle Research | 2003
Teruoki Tago; Shizuka Tashiro; Yukiko Hashimoto; Katsuhiko Wakabayashi; Masahiro Kishida
Journal of Chemical Engineering of Japan | 2008
Hideo Nagata; Haruki Mori; Shizuka Tashiro; Masahiro Kishida; Katsuhiko Wakabayashi