Shoji Kawata | Researchain

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Publication

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Archive | 1990

POSITIVE RESIST COMPOSITION CONTAINING ALKALI-SOLUBLE PHENOLIC RESIN, QUINONEDIAZIDE SULFONIC ACID ESTER PHOTOSENSITIVE AGENT AND POLYHYDROXY SENSITIZER

Takamasa Yamada; Shoji Kawata; Masayuki Oie

Archive | 1992

Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive

Shoji Kawata; Toshiaki Fujii; Teturyo Kusunoki; Motofumi Kashiwagi; Hiroshi Yagi; Kazuko Koito; Shinya Ikeda

Archive | 1990

Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate

Masayuki Oie; Shoji Kawata; Takamasa Yamada; Shinya Ikeda

Archive | 1990

Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds

Masayuki Oie; Shoji Kawata; Takamasa Yamada

Archive | 1992

Positiv-arbeitende Resistzusammensetzung Positive-working resist composition

Shoji Kawata; Toshiaki Fujii; Teturyo Kusunoki; Motofumi Kashiwagi; Hiroshi Yagi; Kasuko Koito; Shinya Ikeda

Archive | 1990

Positive Fotolackzusammensetzung. The positive resist composition.

Masayuki Oie; Shoji Kawata; Takamasa Yamada

Archive | 1990

Positiv arbeitende Photolackzusammensetzung The positive working photoresist composition

Masayuki Oie; Shoji Kawata; Yakamasa Yamada; Shinya Ikeda

Archive | 1990

Positiv-arbeitende Photolackzusammensetzung. Positive-working photoresist composition.

Takamasa Yamada; Shoji Kawata; Masayuki Oie

Archive | 1990

Composition formant réserve

Masayuki Oie; Shoji Kawata; Takamasa Yamada

Archive | 1990

Composition à réserve positive

Masayuki Oie; Shoji Kawata; Yakamasa Yamada; Shinya Ikeda

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Archive Network Publication Hotspot Collaboration

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot

Dive into the research topics where Shoji Kawata is active.

Publication

Featured researches published by Shoji Kawata.

POSITIVE RESIST COMPOSITION CONTAINING ALKALI-SOLUBLE PHENOLIC RESIN, QUINONEDIAZIDE SULFONIC ACID ESTER PHOTOSENSITIVE AGENT AND POLYHYDROXY SENSITIZER

Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive

Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate

Positive resist composition containing quinone diazide sulfonate ester of vinylphenol compounds or isopropenylphenol compounds

Positiv-arbeitende Resistzusammensetzung Positive-working resist composition

Positive Fotolackzusammensetzung. The positive resist composition.

Positiv arbeitende Photolackzusammensetzung The positive working photoresist composition

Positiv-arbeitende Photolackzusammensetzung. Positive-working photoresist composition.

Composition formant réserve

Composition à réserve positive

Collaboration

Dive into the Shoji Kawata's collaboration.