Shu-Xia Zhao

Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas

A two-dimensional self-consistent fluid model combined with the full set of Maxwell equations is developed to investigate an argon capacitively coupled plasma, focusing on the electromagnetic effects on the discharge characteristics at various discharge conditions. The results indicate that there exist distinct differences in plasma characteristics calculated with the so-called electrostatic model (i.e., without taking into account the electromagnetic effects) and the electromagnetic model (which includes the electromagnetic effects), especially at very high frequencies. Indeed, when the excitation source is in the high frequency regime and the electromagnetic effects are taken into account, the plasma density increases significantly and meanwhile the ionization rate evolves to a very different distribution when the electromagnetic effects are dominant. Furthermore, the dependence of the plasma characteristics on the voltage and pressure is also investigated, at constant frequency. It is observed that whe...

Fluid simulation of the E-H mode transition in inductively coupled plasma

One self-consistent method combined with the electromagnetic theory and fluid model is developed to investigate the E-H mode transition of argon inductively coupled plasma (ICP) by adjusting the external electric parameters of the reactor. ICP dynamic characteristics of radial and axial space are also studied when E and H modes coexist. By regulating the radio-frequency current in the coil and voltage across the powered end of the coil and the ground, the E-H mode transition is observed, accompanied by the substantial variations in the electromagnetic field and plasma parameters (density, temperature, and deposited power). Besides, the evolution characteristics of ICP are examined when the discharge mechanism transforms from an E-mode dominated to an H-mode dominated.

The effect of F_{2} attachment by low-energy electrons on the electron behaviour in an Ar/CF_{4} inductively coupled plasma

The electron behaviour in an Ar/CF4 inductively coupled plasma is investigated by a Langmuir probe and a hybrid model. The simulated and measured results include electron density, temperature and electron energy distribution function for different values of Ar/CF4 ratio, coil power and gas pressure. The hybrid plasma equipment model simulations show qualitative agreement with experiment. The effect of F2 electron attachment on the electron behaviour is explored by comparing two sets of data based on different F atom boundary conditions. It is demonstrated that electron attachment at F2 molecules is responsible for the depletion of low-energy electrons, causing a density decrease as well as a temperature increase when CF4 is added to an Ar plasma.

Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas

Both geometrical and electrical asymmetry effects in capacitive argon discharges are investigated using a two-dimensional particle-in-cell coupled with Monte Carlo collision model. When changing the ratio of the top and bottom electrode surface areas and the phase shift between the two applied harmonics, the induced self-bias was found to develop separately. By adjusting the ratio between the high and low harmonic amplitudes, the electrical asymmetry effect at a fixed phase shift can be substantially optimized. However, the self-bias caused by the geometrical asymmetry hardly changed. Moreover, the separate control of these two asymmetry effects can also be demonstrated from their power absorption profiles. Both the axial and radial plasma density distributions can be modulated by the electrical asymmetry effect.

Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF_{4} plasma

In this work, a hybrid model is used to investigate the effect of different gas ratios on the Si etching and polymer film deposition characteristics in an Ar/CF4 inductively coupled plasma. The influence of the surface processes on the bulk plasma properties is studied, and also the spatial characteristics of important gas phase and etched species. The densities of F and CF2 decrease when the surface module is included in the simulations, due to the species consumption caused by etching and polymer deposition. The influence of the surface processes on the bulk plasma depends on the Ar/CF4 gas ratio. The deposited polymer becomes thicker at high CF4 content because of more abundant CFx radicals. As a result of the competition between the polymer thickness and the F flux, the etch rate first increases and then decreases upon increasing the CF4 content. The electron properties, more specifically the electron density profile, affect the Si etch characteristics substantially by determining the radical density and flux profiles. In fact, the radial profile of the etch rate is more uniform at low CF4 content since the electron density has a smooth distribution. At high CF4 content, the etch rate is less uniform with a minimum halfway along the wafer radius, because the electron density distribution is more localized. Therefore, our calculations predict that it is better to work at relatively high Ar/CF4 gas ratios, in order to obtain high etch rate and good profile uniformity for etch applications. This, in fact, corresponds to the typical experimental etch conditions in Ar/CF4 gas mixtures as found in the literature, where Ar is typically present at a much higher concentration than CF4.

Effects of matching network on the hysteresis during E and H mode transitions in argon inductively coupled plasma

An experimental investigation of the hysteresis during the E (capacitive coupling) and H mode (inductive coupling) transitions at various matching situation in argon inductively coupled plasma is reported. At high pressure, the results show two hysteresis loops involved the plasma density, applied power, and forward power, as well as the electrical parameters in the discharge circuit, when the series capacitance is cycled. The measured electron density versus applied power shows that the hysteresis loop shrinks with the decrease of the matching capacitance, and the same trend is discovered on the input current, voltage, and phase angle. In addition, for the case of small capacitance, the current (or voltage) jumps to a low value when the discharge passes through the E to H mode transition regime. Contrarily, for the case of large capacitance, the current jumps to a high value while the voltage is almost constant. The evolution characteristics of the plasma and circuit parameters observed imply that the nonlinear behavior of the matching situation may be one of the determined factors for hysteresis.

Phase-shift effect in capacitively coupled plasmas with two radio frequency or very high frequency sources

A two-dimensional fluid model was built to study the argon discharge in a capacitively coupled plasma reactor and the full set of Maxwell equations is included in the model to understand the electromagnetic effect in the capacitive discharge. Two electrical sources are applied to the top and bottom electrodes in our simulations and the phase-shift effect is focused on. We distinguish the difference of the phase-shift effect on the plasma uniformity in the traditional radio frequency discharge and in the very high frequency discharge where the standing wave effect dominates. It is found that in the discharges with frequency 13.56 MHz, the control of phase difference can less the influence of the electrostatic edge effect, and it gets the best radial uniformity of plasma density at the phase difference π. But in the very high frequency discharges, the standing wave effect plays an important role. The standing wave effect can be counteracted at the phase difference 0, and be enhanced at the phase difference ...

Investigation of the effect of metastable atoms on mode transition in argon inductive discharge via a hybrid model

By using an improved hybrid Monte Carlo/fluid model with the metastable solver and power deposition scheme, we investigate the dynamic characteristics of metastable atoms and their influences on plasma conditions during mode transition, and moreover explore its role in hysteresis by searching the nonlinear mechanism. The evolution behaviours of metastable atoms with power deposition at different pressures are traced. Besides, the effects of metastable atoms and multistep ionization on the variation of plasma parameters, e.g. electron density, temperature and energy distribution function, etc, during the transition are systematically examined. When cycling the inputted electrical parameters, coil current and voltages, hysteresis does not appear. The basic characteristic of plasma dynamics during mode transition is not significantly influenced by the presence of metastable atoms. Moreover, a linearly increasing slope of plasma density with the deposited power is observed and no evidence of nonlinear mechanisms is detected.

Comparison between experiment and simulation for argon inductively coupled plasma

In order to include the nonlocal characteristics of electrons and investigate the inductively coupled plasma (ICP) resources more completely, we have developed a hybrid Monte Carlo (MC)/fluid hybrid model and calculated the axial and radial distributions of electron density, electron temperature, plasma potential, and electron energy distribution functions (EEDFs) of Ar discharge in a planar ICP. Furthermore, to make the model more practical, we still incorporate the effects of metastable atoms, whose sets of rate coefficients and density are, respectively, calculated through the electron MC part and fluid module. Besides, the corresponding Langmuir probe measurements are used to compare these data to validate the simulated results. Under all the selected discharge powers and pressures, the theoretically simulated and experimentally measured quantity profiles agree reasonably with each other, embodied in the generally identical magnitude ranges and spatial distributions. Furthermore, the interpretations a...

Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model

Industrial inductively coupled plasma (ICP) sources are always operated in low gas pressure 10–100 mTorr, therefore in order to accurately investigate the mode transition of ICP, we developed our pure fluid model (2009 J. Appl. Phys. 105 083306) into a hybrid fluid/Monte Carlo (MC) model, where the MC part is exploited to take in more dynamic characteristics of electrons and self-consistently calculate the rate coefficients and electron temperature used in the fluid module, and more crucially to study the electron energy distribution function (EEDF) evolution with mode transition. Due to the introduction of the nonlocal property of the electrons at relatively low pressures, the dependences of the plasma density on the coil current, including the mode transitions, are distinctly different at low and high pressures when simulated by this improved hybrid model (HM), while the trends for different pressures obtained from the original pure fluid model (PFM) are the same in all cases. Furthermore, the computed peaks of the electron density profile by the HM shift from the discharge centre in the E mode to the intense inductive field heating area (about half of the radius of the reaction chamber under the dielectric window) in H mode. In addition, the electron temperature profiles of two modes under different pressures simulated by HM are totally higher than the results of PFM. When the pressure is low, there is a minimum exhibited in the bulk plasma of the electron temperature profiles of the E mode, and along with the mode transition the distribution area of low temperature is substantially reduced. Moreover, this phenomenon disappears when the gas pressure is increased. Accompanied by this, the calculated EEDF of the E mode in the low pressure also demonstrates an absolutely dominant low energy electron fraction (about ≤5 eV); while transforming to the H discharge most of the electrons carry an energy of 1–10 eV. The tendencies of the calculated EEDF evolution with mode transition under relatively high pressures agree well with the experimental measurements of EEDF of Lee et al (2009 Appl. Phys. Lett. 90 191502), but the determination mechanisms are still in dispute and require further examination.