Shubhra Bajpai

Study of nickel interlayer thickness effect on WN/Ni multilayer thin film

Tungsten nitride-Nickel (WN/Ni) multilayer thin films were prepared using reactive magnetron sputtering by varying the Ni interlayer thickness. Microstructure and phase composition were examined using FESEM/EDAX and GIXRD respectively. The mechanical property of the multilayers was calculated using Berkovich nanoindenter. GIXRD showed well defined peaks of W2N phase. Cross-sectional FESEM confirms the alternate layers of WN and Ni having uniform thickness. Mechanical properties showrd that the hardness decreases as the thickness of the soft Ni layer decreases.

Structural and mechanical properties analysis of sputtered W2N/Ni multilayered thin films

In this work a combination of ceramic (Tungsten nitride) with ductile (Nickel), multilayer coatings were deposited on Si (100) substrates by DC magnetron sputtering technique. A series of multilayers were deposited keeping all deposition parameters constant except number of bilayer in similar thickness level. In order to keep deposition time/thickness constant, we have varied number of bilayer of different thickness. Structural characterizations were done by using GIXRD, and FESEM with EDAX. From GIXRD, presence of crystalline W2N phase was confirmed. Existence of alternative layers of tungsten nitride and nickel were revealed from FESEM images. EDAX confirmed the presence of tungsten, nitrogen, and nickel. Mechanical properties of thin films were studied by Nano indentation test. Mechanical properties were found to be influenced with geometrical factor like thickness ratio of ceramic to metal layer in a bilayer arrangement.