Shuji Hayase
Toshiba
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Publication
Featured researches published by Shuji Hayase.
international microprocesses and nanotechnology conference | 2000
Yuusuke Sato; Eishi Shiobara; Junko Abe; Yasunobu Onishi; Yoshihiko Nakano; Shuji Hayase
In this paper, organic silicon cluster is investigated as bottom anti-reflective coating (BARC) material compatible with the RIE mask for the substrate(oxide) etch in a thin resist process for deep UV lithography. It can be simply spin-coated and suppress reflection by single layer BARC process. Excellent etch properties closer to a-Si, namely high etch selectivity of resist:BARC during BARC etch and great etch resistance without deformation during oxide etch, are achieved.
Archive | 2012
Yasuhiko Sato; Yoshihiko Nakano; Rikako Kani; Shuji Hayase; Yasunobu Onishi; Eishi Shiobara; Seiro Miyoshi; Masaki Narita; Sawako Yoshikawa
Archive | 1996
Tatsuro Beppu; Shuji Hayase; Atsushi Kamata; Kenji Sano; Toshiro Hiraoka
Archive | 1986
Yasunobu Onishi; Shuji Hayase; Rumiko Horiguchi; Akiko Hirao
Archive | 1997
Yoshihiko Nakano; Rikako Kani; Shuji Hayase; Yasuhiko Sato; Seiro Miyoshi; Toru Ushirogouchi; Sawako Yoshikawa; Yasunobu Onishi; Masaki Narita; Toshiro Hiraoka
Archive | 2000
Satoshi Mikoshiba; Hiroyasu Sumino; Maki Yonetsu; Shuji Hayase
Archive | 1997
Kenji Todori; Toshiro Hiraoka; Shuji Hayase
Archive | 2002
Shinji Murai; Satoshi Mikoshiba; Hiroyasu Sumino; Shuji Hayase
Archive | 1991
Yasuhiko Sato; Eishi Shiobara; Yasunobu Onishi; Shuji Hayase; Yoshihiko Nakano
Archive | 2001
Lois J. Hobson; Shuji Hayase; Yoshihiko Nakano
