Shunichi Hayamizu

Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition

Zinc oxide (ZnO) films with c‐axis orientation have been prepared on glass substrates by pulsed laser deposition with an ArF excimer laser. The fluctuations of c‐axis orientation of the ZnO films are evaluated by full width at half‐maximum (FWHM) of the rocking curve of the x‐ray diffraction. The ZnO films with a FWHM of 1.9° can be obtained on the optimum conditions (substrate temperature of 500–600 °C, O2 gas pressure of 2–6×10−4 Torr) even at a thickness of 200 nm. We have observed the crystallization of the ZnO during film formation by using in situ reflection high energy electron diffraction. It is confirmed that ZnO thin films with a thickness of up to about 50 nm have c‐axis orientation on the glass substrates.

Development of a bi-directional valve-less silicon micro pump controlled by driving waveform

A new bi-directional valve-less silicon micro pump was proposed based on an analysis using an equivalent circuit model, and the performance of the fabricated pump was studied. The flow direction of the pump can be controlled by changing a driving waveform applied to a PZT plate fixed on a diaphragm. The feasibility of this new bi-directional pumping principle was verified by experiments. The pump generated maximum flow rates of 393 nl/s for forward direction and 323 nl/s for backward direction and maximum pumping pressures of 11.0 kPa for forward direction and 9.9 kPa for backward direction.

New bi-directional valve-less silicon micro pump controlled by driving waveform

A new bi-directional valve-less silicon micro pump was proposed based on the analysis using an equivalent circuit model, and a performance of the fabricated pump was studied. The flow direction of the pump can be controlled by changing a driving waveform applied to a PZT plate fixed on a diaphragm. The feasibility of this new bidirectional pumping principle was verified by the experiments. The pump generated maximum flow rates of 220 nl/s for forward direction and 190 nl/s for backward direction and maximum pumping pressures of 9.7 kPa for forward direction and 8.3 kPa. for backward direction.