Shurui Wang

Subwavelength index engineered surface grating coupler with sub-decibel efficiency for 220-nm silicon-on-insulator waveguides.

Surface grating couplers are fundamental components in chip-based photonic devices to couple light between photonic integrated circuits and optical fibers. In this work, we report on a grating coupler with sub-decibel experimental coupling efficiency using a single etch process in a standard 220-nm silicon-on-insulator (SOI) platform. We specifically demonstrate a subwavelength metamaterial refractive index engineered nanostructure with backside metal reflector, with the measured peak fiber-chip coupling efficiency of -0.69 dB (85.3%) and 3 dB bandwidth of 60 nm. This is the highest coupling efficiency hitherto experimentally achieved for a surface grating coupler implemented in 220-nm SOI platform.

Photonic wire biosensor microarray chip and instrumentation with application to serotyping of Escherichia coliisolates

A complete photonic wire molecular biosensor microarray chip architecture and supporting instrumentation is described. Chip layouts with 16 and 128 independent sensors have been fabricated and tested, where each sensor can provide an independent molecular binding curve. Each sensor is 50 μm in diameter, and consists of a millimeter long silicon photonic wire waveguide folded into a spiral ring resonator. An array of 128 sensors occupies a 2 × 2 mm2 area on a 6 × 9 mm2 chip. Microfluidic sample delivery channels are fabricated monolithically on the chip. The size and layout of the sensor array is fully compatible with commercial spotting tools designed to independently functionalize fluorescence based biochips. The sensor chips are interrogated using an instrument that delivers sample fluid to the chip and is capable of acquiring up to 128 optical sensor outputs simultaneously and in real time. Coupling light from the sensor chip is accomplished through arrays of sub-wavelength surface grating couplers, and the signals are collected by a fixed two-dimensional detector array. The chip and instrument are designed so that connection of the fluid delivery system and optical alignment are automated, and can be completed in a few seconds with no active user input. This microarray system is used to demonstrate a multiplexed assay for serotyping E. coli bacteria using serospecific polyclonal antibody probe molecules.

Broadband polarization independent nanophotonic coupler for silicon waveguides with ultra-high efficiency.

Coupling of light to and from integrated optical circuits has been recognized as a major practical challenge since the early years of photonics. The coupling is particularly difficult for high index contrast waveguides such as silicon-on-insulator, since the cross-sectional area of silicon wire waveguides is more than two orders of magnitude smaller than that of a standard single-mode fiber. Here, we experimentally demonstrate unprecedented control over the light coupling between the optical fiber and silicon chip by constructing the nanophotonic coupler with ultra-high coupling efficiency simultaneously for both transverse electric and transverse magnetic polarizations. We specifically demonstrate a subwavelength refractive index engineered nanostructure to mitigate loss and wavelength resonances by suppressing diffraction effects, enabling a coupling efficiency over 92% (0.32 dB) and polarization independent operation for a broad spectral range exceeding 100 nm.

High-directionality fiber-chip grating coupler with interleaved trenches and subwavelength index-matching structure.

We present the first experimental demonstration of a new fiber-chip grating coupler concept that exploits the blazing effect by interleaving the standard full (220 nm) and shallow etch (70 nm) trenches in a 220 nm thick silicon layer. The high directionality is obtained by controlling the separation between the deep and shallow trenches to achieve constructive interference in the upward direction and destructive interference toward the silicon substrate. Utilizing this concept, the grating directionality can be maximized independent of the bottom oxide thickness. The coupler also includes a subwavelength-engineered index-matching region, designed to reduce the reflectivity at the interface between the injection waveguide and the grating. We report a measured fiber-chip coupling efficiency of -1.3  dB, the highest coupling efficiency achieved to date for a surface grating coupler in a 220 nm silicon-on-insulator platform fabricated in a conventional dual-etch process without high-index overlays or bottom mirrors.

Single-etch subwavelength engineered fiber-chip grating couplers for 1.3 µm datacom wavelength band

We report, for the first time, on the design and experimental demonstration of fiber-chip surface grating couplers based on subwavelength grating engineered nanostructure operating in the low fiber chromatic dispersion window (around 1.3 μm wavelengths), which is of great interest for short-reach data communication applications. Our coupler designs meet the minimum feature size requirements of large-volume deep-ultraviolet stepper lithography processes. The fiber-chip couplers are implemented in a standard 220-nm-thick silicon-on-insulator (SOI) platform and are fabricated by using a single etch process. Several types of couplers are presented, specifically the uniform, the apodized, and the focusing designs. The measured peak coupling efficiency is -2.5 dB (56%) near the central wavelength of 1.3 μm. In addition, by utilizing the technique of the backside substrate metallization underneath the grating couplers, the coupling efficiency of up to -0.5 dB (89%) is predicted by Finite Difference Time Domain (FDTD) calculations.

Disorder effects in subwavelength grating metamaterial waveguides

Subwavelength grating (SWG) waveguides are integrated photonic structures with a pitch substantially smaller than wavelength for which they are designed, so that diffraction effects are suppressed. SWG operates as an artificial metamaterial with an equivalent refractive index which depends on the geometry of the structure and the polarization of the propagating wave. SWG waveguides have been advantageously used in silicon photonics, resulting in significant performance improvements for many practical devices, including highly efficient fiber-chip couplers, waveguide crossings, broadband multimode interference (MMI) couplers, evanescent field sensors and polarization beam splitters, to name a few. Here we present a theoretical and experimental study of the influence of disorder effects in SWG waveguides. We demonstrate via electromagnetic simulations and experimental measurements that even a comparatively small jitter (~5 nm) in the position and size of the SWG segments may cause a dramatic reduction in the transmittance for wide (multimode) SWG waveguides, while for narrow (single mode) waveguides this effect is negligible. Our study shows that the impact of the jitter on SWG waveguide performance is directly related to the modal confinement.

Silicon photonic integration with subwavelength gratings

Subwavelength grating structures with a pitch smaller than the Bragg resonance length can be used for engineering the refractive index in silicon photonic waveguides. We discuss the principles, design, fabrication and applications of subwavelength nanostructures in silicon photonics and review our recent results on fiber-chip coupling structures, surface grating couplers, waveguide crossings, and athermal waveguides with a polymersilicon hybrid core.

Selecting the polarization in silicon photonic wire components

Silicon photonic wire waveguides are usually highly birefringent, so they are generally designed to operate for one particular polarization. For commonly used waveguides with a silicon thickness of 220 nm, TE polarization is preferred since TM is only weakly guided. For waveguides with a silicon thickness larger than 250 nm, both TE and TM polarizations have been employed. Overall, the choice of polarization has largely appeared arbitrary. In this presentation we review the pertinent polarization-dependent waveguide properties, including losses, back-reflection, polarization conversion and fabrication tolerances, with the intent to suggest guidelines for choosing the proper polarization. Through experimental evidence, we show that TM polarization has several important advantages and can support high performance resonators with a radius down to 2 μm.

Subwavelength engineered structures for integrated photonics

We report our advances in development of subwavelength engineered structures for integrated photonics. This unique technology allows synthesis of an effective photonic medium with an unprecedented control of material properties, constituting a powerful tool for a designer of photonic integrated circuits. By locally engineering the refractive index of silicon by forming a pattern of holes at the subwavelength scale it is possible to manipulate the flow of light in silicon photonic waveguides. We have demonstrated a number of subwavelength engineered devices operating at telecom wavelengths, including fiber-chip couplers, waveguide crossings, WDM multiplexers, ultra-fast optical switches, athermal waveguides, evanescent field sensors, polarization rotators, transceiver hybrids and colorless interference couplers. The subwavelength metamaterial concept has been adopted by industry (IBM) for fiber-chip coupling and subwavelength engineered structures are likely to become key building blocks for the next generation of integrated photonic circuits. We present an overview of different implementations of these structures in silicon photonic integrated circuits, such as high-efficiency fiber-chip couplers, wavelength multiplexers, microspectrometers, waveguide crossovers, ultra-broadband splitters and mid-infrared waveguide components, to name a few.

Subwavelength engineering in silicon photonics

Subwavelength engineering in silicon photonic integrated circuits is a powerful design tool that allows one to synthesize an effective photonic medium with adjustable refractive index. This creates a new degree of freedom in photonic circuit design. We present an overview of the fundamental concept and its application to address several important practical challenges in the implementation of silicon photonics as a next generation photonics platform for telecom, datacom and sensing. In particular, we report our results in developing highly efficient and broadband fiber-chip couplers for silicon photonic wire waveguides using subwavelength engineered edge coupling structures. We experimentally demonstrate a coupling efficiency of -0.4 dB and polarization independent operation for a broad spectral range exceeding 100 nm for optical fiber with a core diameter of 3.2 μm. For coupling to standard SMF-28 fiber with 10.4 μm mode field diameter we numerically demonstrate a subwavelength engineered overlayer structure composed of SiO2 and Si3N4 which exhibits an overall coupling efficiency exceeding 90%. We have also used our subwavelength structure for coupling experiments with a conventional InGaAsP/InP buried heterostructure laser at λ = 1.3 μm with a measured near field mode size of 2.1 μm×2.8 μm. Peak coupling efficiency is 1.5 dB with 1-dB alignment tolerance of approximately ±1.2 μm horizontally and ±0.8 μm vertically. We further present subwavelength engineered grating couplers fabricated in a single-etch step for the telecom (1.55 μm) and datacom (1.3 μm) wavelengths with efficiencies exceeding -0.5 dB. Further applications that will be discussed include waveguide crossings, microspectrometers, ultra-fast optical switches, athermal waveguides, evanescent field sensors, polarization rotators and colorless interference couplers.