Sivapackia Ganapathiappan

Fabrication process of molecular memory circuits by nanoimprint lithography

We have utilized the nanoimprint lithography process described this paper to fabricate a rewritable, nonvolatile memory cell with an equivalent density of 6.4 Gbits/cm2. The architecture of the circuit was based on an 8x8 crossbar structure with an active molecular layer sandwiched between the top and bottom electrodes. A liftoff process was utilized to produce the top and bottom electrodes, made of Pt/Ti bilayers. The active molecular layer was deposited by the Languir-Blodgett technique. We proposed the use of a new class of nanoimprint resist formulated by dissolving a polymer in its monomer, such as poly(benzyl methacrylate) dissolved in benzyl methacrylate (~8%/92% wt). The new resist enabled us to achieve Pt /Ti lines of 40 nm in width and 130 nm in pitch, as described in this paper. Our overall nanofabrication process has the advantages of relatively low temperature (~70°C) and pressure (~500 psi or 4.5 MPa), both of which are critical to preserving the integrity of the molecular layer.