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Featured researches published by Soichi Ogawa.


Japanese Journal of Applied Physics | 1989

High-Energy Ion Beam Analysis of YBa2Cu3Ox Thin Films

Michio Watamori; Kenjiro Oura; Fumiya Shoji; Tsutomu Yotsuya; Soichi Ogawa; Teruo Hanawa

The composition and crystalline structure of high-Tc superconducting YBa2Cu3Ox thin films formed on MgO(100) and Si(100) substrates have been investigated by Rutherford backscattering and channeling techniques. Y, Ba, Cu contents have been analyzed by employing a high-energy (over 4.5 MeV) 4He ions and large scattering angle (near 170°) condition, where Y, Ba and Cu peaks are clearly separated from each other. Oxygen concentration has been obtained through the use of low primary energy (below 2.5 MeV) and small scattering angle (below 150°) conditions, where the O peak is separated from the background. The crystalline quality of the films has also been investigated by ion channeling techniques.


Applied Surface Science | 1988

The effect of charged particles when preparing ZnO thin film by ion beam sputtering deposition

Yoshihiko Suzuki; Tsutom Yotsuya; Katsumi Takiguchi; Masaaki Yoshitake; Soichi Ogawa

Abstract Zinc oxide films have been prepared by ion beam sputtering deposition. The irradiation effects of the charged particles on the ZnO film crystallographic orientation during deposition are studied. Two methods are adopted to control the bombardment of the charged particles. One applies a bias voltage to the substrate, and the other bombards the substrate with ions. When the substrate is positively biased, the c -axis preferred orientation of the ZnO film is destroyed by the negatively charged particles. When the substrate is negatively biased, or irradiated with argon ions from a side ion gun, certain conditions lead to c -axis orientation. When the substrate is irradiated with oxygen ions, a change to c -axis orientation can clearly be observed. Positive oxygen ion irradiation presumably has an effect on the formation of ZnO film c -axis orientation.


Archive | 1989

High Magnetic Field Shielding Devices with Superconducting NbTi-Cu Multilayer Films

Soichi Ogawa; Masaaki Yoshitake; Kazu Nishigaki; Takao Sugioka; Masaru Inoue; Yoshiro Saji

We have studied the magnetic shielding effects of various hollow disks with superconducting NbTi-Cu multilayer films in vertical magnetic field. The hollow disk has an outer diameter(O.D.) of 60mm and an inner diameter(I.D.) ranging from 0 to 40mm by using the multilayer films composed of two NbTi-Cu layers which NbTi or Cu layer is 5.0um thick, respectively. As the increasing I.D. of the disks from 0 to 40mm, ΔBm (maximum magnetic shielding effects) decreased from 0.11 to 0.024-T. These studies have developed for high magnetic shielding devices which were formed by piling the hollow superconducting disks and A1 disks alternately. The device provided a space free from high magnetic field up to 0.8T.


Proceedings of the Twelfth International Cryogenic Engineering Conference Southampton, UK, 12–15 July 1988 | 1988

MAGNETIC SHIELD EFFECTS OF SUPERCONDUCTING NbTi-Cu MULTI-LAYER FILMS

Soichi Ogawa; Masaaki Yoshitake; Takao Sugioka; Masaru Inoue; Yoshiro Saji

We have carried out the experimental study on magnetic shield effects of NbTi-Cu multilayers film deposited alternately NbTi and Cu films of various thickness. The thickness dependence of ΔBm/nd (ΔBm:max. magnetic shield effect, [d]:film thickness) with the parameter of the number of NbTi layers (n) for the multilayers film are investigated. In the region of [nd]>3μm and in any case of [n]=1,2,3,ΔBm/nd increases exponentially with decreasing [nd] and increasing [n].The relation between ΔBm/nd and [nd] is given the following formula in(ΔBm/nd)=α-βin(nd), α,β (constant). From these results, it is possible to completely seal off a magnetic field of a tesla or more by laminating NbTi-Cu multilayers film of reasonable thickness.


Shinku | 1989

Surface Modification of Pitch Based Carbon Fiber By Low Frequency (60 Hz) Plasma Treatment

Junichi Fujita; Takao Kakuno; Soichi Ogawa; Toshikazu Nosaka


Shinku | 1987

ZnO Thin Films Prepared by Ion Beam Sputtering Deposition

Yoshihiko Suzuki; Tsutom Yotsuya; Soichi Ogawa; Akira Iwata; Masakuni Tokai; Yoshinori Dake


Shinku | 1987

Zr-N Films Sputter Deposited in Pure Nitrogen

Masaaki Yoshitake; Soichi Ogawa; Katsumi Takiguchi


Shinku | 1987

Ion Beam Sputter Deposition of TbFeCo Films

Shuichi Nogawa; Shinichi Takano; Koji Okamoto; Yoshihiko Suzuki; Soichi Ogawa; Shunsuke Matsushita


Shinku | 1987

A Thin Film Vacuum Sensor Formed on Polyimide Substrate for Thermal Conductivity Vacuum Gauge

Akira Aoki; Katsumi Takiguchi; Soichi Ogawa; Toshikazu Okada


Shinku | 1985

Study of Pressure Measurement by Ultrasonic Sensor

Tadaoki Kusaka; Keiji Yasui; Tadayoshi Shioyama; Soichi Ogawa

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Katsumi Takiguchi

Industrial Research Institute

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Masaaki Yoshitake

Industrial Research Institute

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Yoshihiko Suzuki

Industrial Research Institute

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Tadayoshi Shioyama

Industrial Research Institute

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Tsutomu Yotsuya

Industrial Research Institute

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Tsutom Yotsuya

Industrial Research Institute

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Akira Aoki

Industrial Research Institute

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