Soo Gil Park

Electrochemical glucose detection using nickel-implanted boron-doped diamond electrodes

Nickel-implanted boron-doped diamond electrodes (Ni-DlA) were fabricated in view of their application for carbohydrate detection. This electrode produced well-defined and reproducible voltammograms for 1 mM glucose in alkaline media. The electrode exhibited excellent electrochemical stability with low background current even after ultrasonic treatment, indicating the strong bonding of nickel with carbon. These results indicate the promising use of Ni-DIA for the detection of carbohydrates and amino acids, and thus, an application of ion implantation as the surface modification method is effective for controlling the electrochemical properties of polycrystalline diamond thin films.

A study of the crystalline growth of highly boron-doped CVD diamond: preparation of graded-morphology diamond thin films

Abstract An investigation was made of graded-morphology diamond thin films deposited on Si substrates by use of the microwave plasma chemical vapor deposition (CVD) technique. The preparation of graded diamond thin films not only offers new perspectives into functional materials, but it also gives clues to the growth mechanism of CVD diamond. Although it is clear that the substrate temperature and the deposition time affect the grain size in particular, the difference depending on the boron concentration in the growing process was studied in the present work. As a result, in highly boron-doped (104 ppm) diamond films, the Raman peak which was ascribed to the boron-doping was not observed at the very initial growth stage. However, the crystal growth process was almost irrelevant for the boron-doping quantity. Furthermore, we showed the morphology dependence of electrochemical properties as one example of the excellent functions of the graded-morphology highly boron-doped diamond film.

Preparation of graded-morphology diamond thin films

Graded-morphology diamond thin films were prepared in a single experimental run using a simple technique during the chemical vapor deposition (CVD) process: one end of the substrate was elevated. We showed that the substrate temperature had a profound effect on the morphology and grain size of the as-deposited lightly boron-doped diamond films. We have discussed the morphological dependence of electrochemical properties as one example of the excellent function of the graded film.