Stanisław Krukowski

Luminescence and reflectivity in the exciton region of homoepitaxial GaN layers grown on GaN substrates

Abstract In this work we report results of photoluminescence (PL) and reflectivity measurements in the exciton region of GaN homoepitaxial layers grown by metalorganic chemical vapour deposition on GaN substrates. At low temperature (4.2K), very narrow (FWHM = 1.0meV) PL lines related to excitons bound to neutral acceptor (3.4666eV) and neutral donor (3.4719eV) were observed. The energies of free excitons from reflectivity and PL measurements were found to be: E A = 3.4780eV, E B = 3.4835eV and E C = 3.502eV.

Thermal conductivity of GaN crystals in 4.2- 300 K range

Results of measurements of thermal conductivity of bulk GaN crystals in the temperature interval 4.2 – 300 K are reported. Experiments were performed on two types of single GaN crystals grown under high-pressure: highly conducting n-type sample and on a highly resistive sample compensated by magnesium doping. For n-GaN crystals, the highest thermal conductivity kmax is equal to 1600 W/m K at Tmax ¼ 45 K; and k . 220 W/m K at 300 K. Our analysis indicates that for the best n-GaN crystal and for T

Thermal properties of indium nitride

Tmax; the contribution of Umklapp phonon scattering processes dominate whereas for other samples scattering of phonons by point mass defects represents the main contribution. The dependence of kðTÞ is used to reveal possible mechanisms of thermal resistance of GaN crystals at temperatures Tmax: Our thermal conductivity measurements yields Debye’s temperature uD < 400 K: q 2003 Elsevier Ltd. All rights reserved.

Evidence of free carrier concentration gradient along the c-axis for undoped GaN single crystals

Abstract Indium nitride single crystals, grown by the nitrogen microwave plasma method have been used in the determination of thermal properties of InN. Specific heat of InN was measured in the temperature interval between 150 and 300 K. InN Debye temperature and Gruneisen parameter calculated from these data are: Θ = 660 K and γ = 0.77. Thermal conductivity of InN has been measured by the laser-flash method. The InN thermal conductivity, obtained from measurement of InN ceramics, was 45 W/(m·K) This is much below 176 W/(m·K), the ideal lattice estimate based on phonon-phonon inelastic scattering, indicating a large contribution from point defects and grain boundaries to phonon scattering. InN vs. In + N 2 stability has been studied by ultra-high-pressure X-ray measurements: for nitrogen pressure p = 60 kbar, InN has been found to be stable up to T = 710 ± 10 °C. It has been also demonstrated that the decomposition of InN at temperatures below 660 °C is kinetically controlled.

Correlation between luminescence and compositional striations in InGaN layers grown on miscut GaN substrates

Results of measurements of infrared reflectivity and micro-Raman scattering on the undoped GaN high pressure grown single crystals are reported. These crystals have usually a high electron concentration due to unintentional doping by oxygen. We show, by the shift of the plasma edge (infrared reflectivity measurements), that the free electron concentration is always higher on the (0 0 0 % 1)N face of the GaN single crystal than on the (0 0 0 1)Ga face. In order to determine the profile of the free carrier concentration, we performed transverse micro-Raman scattering measurements along the (0 0 0 1) c-axis of the crystal with spatial resolution of 1mm. Micro-Raman experiments give a quantitative information on the free carrier concentration via the longitudinal optical phonon–plasmon (LPP) coupling modes. Thus, by studying the behavior of the LPP mode along the c-axis, we found the presence of a gradient of free electrons. We suppose that this gradient of electrons is due to the gradient of the main electron donor, in undoped GaN single crystals, i.e. oxygen impurity. We propose a growth model which explains qualitatively the incorporation of oxygen during the growth of GaN crystal under high pressure of nitrogen. # 2001 Elsevier Science B.V. All rights reserved.

A comparative DFT study of electronic properties of 2H-, 4H- and 6H-SiC(0001) and SiC(000 \bar{1} ) clean surfaces: significance of the surface Stark effect

The influence of the miscut angle of GaN substrate on compositional and optical properties of InxGa1−xN epilayers (0.05<x<0.1) was examined using x-ray diffraction, photoluminescence (PL), cathodoluminescence, and Z-contrast scanning electron microscopy. We show that single atomic steps bunch during growth of InGaN and form macrosteps. Indium is incorporated differently at treads and risers of these macrosteps, which causes the layer to decompose and induces the formation of compositional growth striations. Since the growth step density increases with growing miscut angle of the substrate, the average indium concentration decreases and the average PL peak energy blueshifts and broadens with increasing miscut angle. The presented work enables understanding on microscopic scale effects related to the inhomogeneous distribution of indium in InGaN layers on miscut substrates, which is significant from the point of view of optoelectronic applications.

Fermi level influence on the adsorption at semiconductor surfaces—ab initio simulations

The electric field, uniform within a slab, emerging due to Fermi level pinning at both sides of the slab, is analyzed using DFT simulations of SiC surface slabs of different thicknesses. It is shown that for thicker slabs the field is nonuniform and this fact is related to the surface state charge. Using the electron density and potential profiles, it is proved that for high-precision simulations it is necessary to take into account a sufficient number of SiC layers. We show that the use of 12 diatomic layers leads to satisfactory results. It is also demonstrated that the change of the opposite side slab termination, both by different types of atoms or by their location, can be used to adjust the electric field within the slab, creating a tool for simulation of surface properties, depending on the doping in the bulk of the semiconductor. Using these simulations, it was found that, depending on the electric field, the energy of the surface states changes in a different way than the energy of the bulk states. This criterion can be used to distinguish Shockley and Tamm surface states. The electronic properties, i.e. energy and type of surface states of the three clean surfaces: 2H-, 4H-, 6H-SiC(0001) and SiC(), are analyzed and compared using field-dependent DFT simulations.Electric field, uniform within the slab, emerging due to Fermi level pinning at its both sides is analyzed using DFT simulations of the SiC surface slabs of different thickness. It is shown that for thicker slab the field is nonuniform and this fact is related to the surface state charge. Using the electron density and potential profiles it is proved that for high precision simulations it is necessary to take into account enough number of the Si-C layers. We show that using 12 diatomic layers leads to satisfactory results. It is also demonstrated that the change of the opposite side slab termination, both by different type of atoms or by their location, can be used to adjust electric field within the slab, creating a tool for simulation of surface properties, depending on the doping in the bulk of semiconductor. Using these simulations it was found that, depending on the electric field, the energy of the surface states changes in a different way than energy of the bulk states. This criterion can be used to distinguish Shockley and Tamm surface states. The electronic properties, i.e. energy and type of surface states of the three clean surfaces: 2H-, 4H-, 6H-SiC(0001), and SiC(

Surface reaction of nitrogen with liquid group III metals

000 \bar{1}

Annealing of GaN under high pressure of nitrogen

) are analyzed and compared using field dependent DFT simulations.

On the nature of Surface States Stark Effect at clean GaN(0001) surface

Chemical adsorption of the species at semiconductor surfaces is analyzed showing the existence of the two contributions to adsorption energy: bond creation and charge transfer. It is shown that the energy of quantum surface states is affected by the electric field at the surface, nevertheless, the potential contribution of electron and nuclei cancels out. The charge transfer contribution is Fermi level independent for pinned surfaces. Thus for Fermi level pinned at the surface, the adsorption energy is independent on the Fermi energy, i.e., the doping in the bulk. The DFT simulations of adsorption of hydrogen at clean GaN(0001) and silicon at SiC(0001) surfaces confirmed independence of adsorption energy on the doping in the bulk. For the Fermi level nonpinned surfaces, the charge contribution depends on the position of Fermi level in the bulk. Thus adsorption energy is sensitive to change of the Fermi energy in the bulk, i.e., the doping. The DFT simulations of adsorption of atomic hydrogen at 0.75 ML hy...