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Stephan Bradl

Siemens

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Publication

Featured researches published by Stephan Bradl.

Archive | 1998

Device and method for end-point monitoring used in the polishing of components, in particular semiconductor components

Stephan Bradl; Olaf Heitzsch

Archive | 2001

Method, system, and method of using a component for setting the electrical characteristics of microelectronic circuit configurations

Stephan Bradl; Oliver Gehring; Olaf Heitzsch

Archive | 1998

Device and method for cleaning polishing pads, such as polishing cloths, especially for polishing wafers

Stephan Bradl; Olaf Heitzsch; Olaf Kühn; André Richter

Archive | 1997

Application especially of photolithographic developer to surface

Stephan Bradl; Elke Dipl.-Chem. Hietschold

Archive | 1997

Vorrichtungen, Verwendung und Verfahren zum Aufbringen einer Substanz auf eine Oberfläche eines Halbleiterwafers

Stephan Bradl; Elke Dipl.-Chem. Hietschold

Archive | 2002

Apparatus and method for detecting a work piece in an automatic processing apparatus

Stephan Bradl; Olaf Heitzsch

Archive | 2001

Informationsredundante nichtflüchtige Halbleiterspeicherzelle sowie Verfahren zu deren Herstellung und Programmierung Informationsredundante non-volatile semiconductor memory cell and to processes for their preparation and programming

Stephan Bradl; Olaf Heitzsch

Archive | 2001

Verfahren und System zum Einstellen der elektrischen Eigenschaften mikroelektrischer Schaltungsanordnungen sowie Verwendung eines mikroelektronischen Schaltungselements A method and system for adjusting the electrical properties of microelectric circuitry, as well as use of a microelectronic circuit element

Stephan Bradl; Oliver Gehring; Olaf Heitzsch

Archive | 2000

Verfahren und Anordnung zum Einstellen der elektrischen Eigenschaften mikroelektronischer Schaltungsanordnungen sowie Verwendung eines mikroelektronischen Schaltungselements Method and arrangement for adjusting the electrical properties of microelectronic circuits and the use of a microelectronic circuit element

Stephan Bradl; Oliver Gehring; Olaf Heitzsch

Archive | 1998

Method and apparatus for endpoint detection in polishing of components, especially semiconductor components

Stephan Bradl; Olaf Heitzsch

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Collaboration

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Olaf Heitzsch

Siemens

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Elke Dipl.-Chem. Hietschold

Siemens

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Oliver Gehring

Qimonda

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Michael Schmidt

Infineon Technologies

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