Stuart Irvine

Grain and crystal texture properties of absorber layers in MOCVD-grown CdTe/CdS solar cells

The microstructure of 4?13 ?m thick CdTe absorber layers in CdTe/CdS/ITO/glass solar cell structures grown by metal-organic chemical vapour deposition (MOCVD) at 350 ?C has been studied. The crystalline texture, lattice parameter and grain size were measured as a function of thickness for the as-grown layers, and as a function of annealing temperature and time for annealing in both nitrogen (N2) and cadmium chloride (CdCl2) environments. The average grain sizes developed with thickness as r (?m) = 0.050x ? 0.10 (4 < x < 12 ?m), and this behaviour is contrasted with that for close-spaced sublimation material grown at 500 ?C. Annealing in both ambients promoted grain growth (with Rayleigh grain size distribution functions and Burke?Turnbull exponents being n = 7 at 440 ?C and ~4 at 400 ?C), a development of the grown-in preferred orientation from [1?1?1] to [2?1?1], and relief of the grown-in compressive stress. A growth mechanism by which development of the [2?1?1] preferred orientation may accompany grain growth is described. It is concluded that MOCVD growth at temperatures higher than 350 ?C used here will be required to produce the larger grain sizes required for photovoltaic applications.

Interpretation of inverted photocurrent transients in organic lead halide perovskite solar cells: proof of the field screening by mobile ions and determination of the space charge layer widths

In Methyl Ammonium Lead Iodide (MAPI) perovskite solar cells, screening of the built-in field by mobile ions has been proposed as part of the cause of the large hysteresis observed in the current/voltage scans in many cells. We show that photocurrent transients measured immediately (e.g. 100 μs) after a voltage step can provide direct evidence that this field screening exists. Just after a step to forward bias, the photocurrent transients are reversed in sign (i.e. inverted), and the magnitude of the inverted transients can be used to find an upper bound on the width of the space charge layers adjacent to the electrodes. This in turn provides a lower bound on the mobile charge concentration, which we find to be ≳1 × 1017 cm−3. Using a new photocurrent transient experiment, we show that the space charge layer thickness remains approximately constant as a function of bias, as expected for mobile ions in a solid electrolyte. We also discuss additional characteristics of the inverted photocurrent transients that imply either an unusually stable deep trapping, or a photo effect on the mobile ion conductivity.

Highly Arsenic Doped CdTe Layers for the Back Contacts of CdTe Solar Cells

In an effort to overcome the lack of a suitable metal as an ohmic back contact for CdTe solar cells, a study was carried out on the potential for using a highly arsenic (As) doped CdTe layer with metallization. The deposition of full CdTe/CdS devices, including the highly doped CdTe:As and the CdCl2 treatment, were carried out by metal organic chemical vapour deposition (MOCVD), in an all-in-one process with no etching being necessary. They were characterized and compared to control devices prepared using conventional bromine-methanol back contact etching. SIMS and C-V profiling results indicated that arsenic concentrations of up to 1.5 × 1019 at·cm-3 were incorporated in the CdTe. Current-voltage (J-V) characteristics showed strong improvements, particularly in the open-circuit voltage (Voc) and series resistance (Rs): With a 250 nm thick doped layer, the series resistance was reduced from 9.8 Ω·cm2 to 1.6 Ω·cm2 for a contact area of 0.25 cm2; the J-V curves displayed no rollover, while the Voc increased by up to 70 mV (~ 12 % rise). Preliminary XRD data show that there may be an As2Te3 layer at the CdTe surface which could be contributing to the low barrier height of this contact.

Combinatorial optimization of Al-doped ZnO films for thin-film photovoltaics

A rapid screening methodology for the development of transparent conducting oxides is presented. The methodology, based on a combination of spectrophotometry, ellipsometry and 4-point probe measurements, was used to map out the opto-electronic properties over a co-sputtered ZnO : Al2O3 film deposited from separate ceramic targets of ZnO and Al2O3. Clear distributions for the carrier density, ne, and mobility, μe, are determined as a function of wt%. Al2O3 content within the film. A minimum resistivity value of 7.6 × 10−4 Ω cm was achieved for a composition of 1.5 wt%. Al2O3.

SIMS analysis of intentional in situ arsenic doping in CdS/CdTe solar cells

A series of CdTe/CdS devices with different tris(dimethylamino)arsine (TDMAAs) partial pressures were grown by metal organic chemical vapour deposition (MOCVD) to investigate the incorporation of arsenic into the bulk. Characterization of the growth layers using secondary ion mass spectrometry (SIMS) showed arsenic concentrations ranging from 1 × 1016 to 1 × 1019 atoms cm−3. A square law dependence of arsenic concentration on the TDMAAs vapour concentration was observed. A reaction mechanism for the decomposition of TDMAAs precursor via dimerization is presented and discussed in terms of reaction kinetics.

Comparative study of trap densities of states in CdTe∕CdS solar cells

Density of deep and shallow states has been investigated in three different kinds of CdTe∕CdS samples, two of which were grown by metal-organic chemical vapor deposition (MOCVD) and one by close-space sublimation (CSS) methods. The MOCVD samples were p doped by As and grown either with or without a ZnO buffer layer between the transparent conductor and CdS layers. Capacitance-voltage, admittance spectroscopy, and quantum efficiency measurements show pronounced effects of As doping and ZnO incorporation. It is found that A centers and vacancies of Cd, usually observed in CSS devices, are absent in the defect spectra of MOCVD samples.

Solar Cells and Photovoltaics

Photovoltaic solar cells are gaining wide acceptance for producing clean, renewable electricity. This has been based on more than 40 years of research that has benefited from the revolution in silicon electronics and compound semiconductors in optoelectronics. This chapter gives an introduction into the basic science of photovoltaic solar cells and the challenge of extracting the maximum amount of electrical energy from the available solar energy. In addition to the constraints of the basic physics of these devices, there are considerable challenges in materials synthesis. The latter has become more prominent with the need to reduce the cost of solar module manufacture as it enters mainstream energy production. The chapter is divided into sections dealing with the fundamentals of solar cells and then considering six very different materials systems, from crystalline silicon through to polycrystalline thin films and perovskites. These materials have been chosen because they are all either in production or have the prospect of being in production over the next few years. Many more materials are being considered in research and some of the more exciting, excitonic cells and nanomaterials are mentioned. However, there is insufficient space to give these very active areas of research the justice they deserve. I hope the reader will feel sufficiently inspired by this topic to read further and explore one of the most exciting areas of semiconductor science. The need for high-volume production at low cost has taken the researcher along paths not normally considered in semiconductor devices and it is this that provides an exciting challenge.

A comparison of in situ As doping with ex situ CdCl2 treatment of CdTe solar cells

A comparison has been made of MOCVD grown CdTe/CdS solar cells processed either by ex situ annealing with CdCl2 or doping with arsenic, in situ, together with various optional anneals. A materials comparison was made of both routes using Jsc measurements on arrays of gold contacts to the CdTe. The Jsc increased from around 1 mA cm-2 for undoped and unannealed layers to a range of 25-30 mA cm-2 for CdCl2 annealed layers. In situ arsenic doping resulted in Jsc values up to 18 mA cm-2. The annealing characteristics were very different for these films, compared with the CdCl2 annealed films, with annealing at 500°C dramatically reducing the Jsc. Only annealing under nitrogen at 400°C produced an improvement in Jsc and further evidence from SIMS analysis suggests that hydrogen passivation of the arsenic dopant may have a significant effect on the dopant activity.

In situ monitoring of parasitic growth on the quartz top plate during the MOVPE growth of GaAs/AlGaAs structures

Work on the analysis by in situ monitoring using a 980 nm laser reflectometer of parasitic deposition during MOVPE growth of GaAs/AlGaAs layers in an Aix-2400 planetary reactor is presented here. Real-time growth rates for parasitic deposition have been measured for the first time. The parasitic deposition does not have a linear growth rate during growth of the n-DBR layers in a VCSEL structure. During the early stages of buffer growth and subsequent baking experiments at 850°C, a reflectance signal was detected from the substrates indicating significant penetration through the deposit at this wavelength.

Epitaxial Crystal Growth: Methods and Materials

Epitaxial growth of thin films of material for a wide range of applications in electronics, optoelectronics, and magneto-optics is a critical activity in many industries. The original technique, in most instances, was liquid-phase epitaxy (LPE) as this was the simplest and often the cheapest route to producing device-quality layers. While some production processes are still based on LPE, most of the research activities and, increasingly, much of the production of electronic and optoelectronic devices is now centered on metal organic chemical vapor deposition (MOCVD ) and molecular beam epitaxy (MBE ). These latter techniques are more versatile, although the equipment is more expensive, and can readily produce multilayer structures with atomic-layer control, which is becoming more and more fundamental to the nanoscale engineering being called upon now to produce device structures in as-grown multilayers. This chapter covers these three basic techniques, including some of their more common variants, and outlines the relative advantages and disadvantages of each of them. Some examples of growth in various materials systems of importance are also outlined for each of the three techniques.