Supratik Guha

Thermally evaporated Cu2ZnSnS4 solar cells

High efficiency Cu2ZnSnS4 solar cells have been fabricated on glass substrates by thermal evaporation of Cu, Zn, Sn, and S. Solar cells with up to 6.8% efficiency were obtained with absorber layer thicknesses less than 1 μm and annealing times in the minutes. Detailed electrical analysis of the devices indicate that the performance of the devices is limited by high series resistance, a “double diode” behavior of the current voltage characteristics, and an open circuit voltage that is limited by a carrier recombination process with an activation energy below the band gap of the material.

Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics

We report on the electrical and microstructural characteristics of La- and Y-based oxides grown on silicon substrates by ultrahigh vacuum atomic beam deposition, in order to examine their potential as alternate gate dielectrics for Si complementary metal oxide semiconductor technology. We have examined the issues of polycrystallinity and interfacial silicon oxide formation in these films and their effect on the leakage currents and the ability to deposit films with low electrical thickness. We observe that polycrystallinity in the films does not result in unacceptably high leakage currents. We show significant Si penetration in both types of films. We find that the interfacial SiO2 is much thicker at ∼1.5 nm for the Y-based oxide compared to the La-based oxide where the thickness is <0.5 nm. We also show that while the Y-based oxide films show excellent electrical properties, the La based films exhibit a large flat band voltage shift indicative of positive charge in the films.

ULTRAVIOLET AND VIOLET GAN LIGHT EMITTING DIODES ON SILICON

We report the fabrication and characterization of GaN-based double heterostructure light emitting diodes grown by molecular beam epitaxy on Si(111) substrates. Light emitting diode operation is achieved by using the conducting Si(111) substrate as a backside n contact and a standard transparent Ni/Au p contact. We observe electroluminescence peaked in the ultraviolet ∼360 nm, with a full width at half maximum of ∼17 nm and in the violet at ∼420 nm. Electron microscopy studies indicate a high density of threading and planar defects. Consequences of these are discussed.

Control of an interfacial MoSe2 layer in Cu2ZnSnSe4 thin film solar cells: 8.9% power conversion efficiency with a TiN diffusion barrier

We have examined Cu2ZnSnSe4 (CZTSe) solar cells prepared by thermal co-evaporation on Mo-coated glass substrates followed by post-deposition annealing under Se ambient. We show that the control of an interfacial MoSe2 layer thickness and the introduction of an adequate Se partial pressure (PSe) during annealing are essential to achieve high efficiency CZTSe solar cells—a reverse correlation between device performance and MoSe2 thickness is observed, and insufficient PSe leads to the formation of defects within the bandgap as revealed by photoluminescence measurements. Using a TiN diffusion barrier, we demonstrate 8.9% efficiency CZTSe devices with a long lifetime of photo-generated carriers.

Degradation of II‐VI based blue‐green light emitters

We have carried out the first detailed structural studies of degradation in II‐VI blue‐green light emitters. Electroluminescence and transmission electron microscopy studies carried out on light emitting diodes fabricated from quantum well laser structures and electroluminescence studies on stripe laser structures show that degradation occurs by the formation and propagation of crystal defects. The studies indicate that room temperature cw lasing in such structures is possibly prevented by the rapid formation of such defects at the high current densities required for lasing.

Ultrathin high-K gate stacks for advanced CMOS devices

Reviews recent progress in and outlines the issues for high-K high-temperature (/spl sim/1000/spl deg/C) poly-Si CMOS processes and devices and also demonstrate possible solutions. Specifically, we discuss device characteristics such as gate leakage currents, flatband voltage shifts, charge trapping, channel mobility, as well as integration and processing aspects. Results on a variety of high-K candidates including HfO/sub 2/, Al/sub 2/O/sub 3/, HfO/sub 2//Al/sub 2/O/sub 3/, ZrO/sub 2/, silicates, and AlN/sub y/(O/sub x/) deposited on silicon by different deposition techniques are shown to illustrate the complex issues for high-K dielectric integration into current Si technology.

Absence of magnetism in hafnium oxide films

We establish the limits of magnetism in thin, electronic grade, hafnium oxide, and hafnium silicate films deposited onto silicon wafers by chemical vapor deposition and atomic layer deposition. To the limits of sensitivity of our measurement techniques, no ferromagnetism occurs in these samples. Contamination by handling with stainless-steel tweezers leads to a measurable magnetic signal. The magnetic properties of this contamination are similar to those attributed to ferromagnetic HfO2 in a recent report, including the magnitude of moment, magnetization field dependence, and spatial asymmetry.

Structural and elemental characterization of high efficiency Cu2ZnSnS4 solar cells

We have carried out detailed microstructural studies of phase separation and grain boundary composition in Cu2ZnSnS4 based solar cells. The absorber layer was fabricated by thermal evaporation followed by post high temperature annealing on hot plate. We show that inter-reactions between the bottom molybdenum and the Cu2ZnSnS4, besides triggering the formation of interfacial MoSx, results in the out-diffusion of Cu from the Cu2ZnSnS4 layer. Phase separation of Cu2ZnSnS4 into ZnS and a Cu–Sn–S compound is observed at the molybdenum-Cu2ZnSnS4 interface, perhaps as a result of the compositional out-diffusion. Additionally, grain boundaries within the thermally evaporated absorber layer are found to be either Cu-rich or at the expected bulk composition. Such interfacial compound formation and grain boundary chemistry likely contributes to the lower than expected open circuit voltages observed for the Cu2ZnSnS4 devices.

Robustness of ultrathin aluminum oxide dielectrics on Si(001)

The stability of Al2O3 films during thermal processing will help determine their usefulness as an alternative gate dielectric for advanced complementary metal-oxide-semiconductor devices. We used medium energy ion scattering and atomic force microscopy to examine the degradation of ultrathin Al2O3 layers under ultrahigh vacuum annealing and the effects of low-temperature oxidation. No degradation is observed at 900 °C, but voids appear at higher temperatures. Growth of interfacial SiO2 takes place during low-pressure oxidation at 600 °C, which may limit the capacitance of extremely thin structures.

Perovskite-kesterite monolithic tandem solar cells with high open-circuit voltage

We report a monolithic tandem photovoltaic device with earth-abundant solution processed absorbers. Kesterite Cu2ZnSn(S,Se)4 and perovskite CH3NH3PbI3 solar cells were fabricated monolithically on a single substrate without layer transfer. The resulting devices exhibited a high open circuit voltage (Voc) of 1350 mV, close to the sum of single-absorber reference cells voltages and outperforms any monolithic tandem chalcogenide device (including Cu(In,Ga)Se2) reported to date. Ongoing optimization of several device elements including the severely limiting top contact electrode is expected to yield superior currents and efficiency. Importantly, our device architecture demonstrates the compatibility and synergistic potential of two of the most promising emerging photovoltaic materials and provides a path for optimization towards >20% efficiency.