Susumu Mori
Nikon
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Publication
Featured researches published by Susumu Mori.
26th Annual International Symposium on Microlithography | 2001
Susumu Mori
The higher numerical aperture ArF scanning exposure tool was developed with completely new platform for further 100nm technology node. This new tool is designed and manufactured with wave front aberration controlled projection lens by using new phase measurement interferometer system, enhanced illuminator structure technology to optimize many various conditions in device production, higher power light source ArF excimer laser and higher speed stages in order to achieve enough required productivity of devices in this node. Not only for the run rate but for the finer accuracy in stage systems and focus control system were involved in this new platform. The actual imaging and accuracy performance will be shown and discussed.
Archive | 1994
Susumu Mori; Tsuyoshi Naraki
Archive | 2017
Kiyoshige Shibazaki; Muneki Hamashima; Susumu Mori; Satoshi Suzuki
Archive | 1996
Masamitsu Yanagihara; Susumu Mori; Tsuyoshi Naraki; Masami Seki; Seiji Miyazaki; Tsuyoshi Narabe; Hiroshi Chiba
Archive | 2002
Yukako Matsumoto; Susumu Mori; Taro Ogata
Archive | 1989
Susumu Mori; Masato Shibuya
Archive | 1994
Kazuaki Saiki; Susumu Mori; Hiroshi Shirasu
Archive | 2011
Kiyoshige Shibazaki; Muneki Hamashima; Susumu Mori; Satoshi Suzuki
Archive | 1994
Hiroshi Chiba; Seiji Miyazaki; Susumu Mori; Takeshi Narabe; Takeshi Naraki; Masami Seki; Masamitsu Yanagihara; 洋 千葉; 毅 奈良部; 聖二 宮崎; 政光 柳原; 剛 楢木; 昌美 関
Archive | 1999
Masayuki Murayama; Kyoji Nakamura; Taro Ogata; Susumu Mori
