Swami Ganesh

A Technique for Predicting Distortion and Evaluating Stress Relief in Metal Forming Operations

A technique was developed to study distortion problems as they occur during metal stamping operations. The technique employs photoetching of specially designed patterns to predict and reveal distortion and to identify its causes. A pattern with center web and longitudinal elements on both sides was successfully used to explain causes of distortion encountered during stamping of Cu-Be alloy strips. The technique was also used to evaluate the effectiveness of various residual stress relief treatments in the strips. It can be used as an effective quality control tool to screen incoming material prior to metal forming operations.