Swe-Kai Chen

Thermal characteristics of Al2O3-MgO and Al2O3-spinel castables for steel ladles

The hot properties of the Al2O3–MgO castables containing 5.5 wt.% MgO and 1.36 wt.% CaO with and without the addition of 0.75 wt.% microsilica and the Al2O3–spinel castables containing 20 wt.% Al2O3–rich spinel of 90 wt.% Al2O3 and 1.70 wt.% CaO, respectively, were investigated. The thermal shock damage test using the prism quench into water technique indicated that the retained modulus of rupture of the Al2O3–MgO castables after three cycles was down to 5%, while that of the Al2O3–spinel castables was 51%. The combined test of slag and thermal shock attack on castables using the rotary slag test furnace showed that the Al2O3–MgO castables had 0% penetration and 24% erosion, while the Al2O3–spinel castables had 10% penetration and 30% erosion. The field trials confirmed that Al2O3–MgO castables have better slag resistance and a longer service life for use in steel ladles, compared to Al2O3–spinel castables. The importance of thermal shock damage resistance of castables for use in steel ladles should be deemphasized, based on the lab and field tests. There is no correlation between hot strengths and slag resistance for castables. The magnitude of specific surface area of pores is more important than pore size and porosity for governing the slag resistance of Al2O3– MgO castables, with and without microsilica addition. # 2002 Elsevier Science Ltd and Techna S.r.l. All rights reserved.

Low-resistivity oxides in TixFeCoNi thin films after vacuum annealing

ABSTRACT In this study, we investigated the electrical properties and microstructures of FeCoNi, Ti0.5FeCoNi, and TiFeCoNi thin films, with the aim of identifying new oxygen-deficient oxides with low resistivity. The resistivity values of as-deposited FeCoNi, Ti0.5FeCoNi, and TiFeCoNi films were 1089, 2883, and 5708 μΩ-cm, respectively. After vacuum annealing at 1000°C for 30 min, the resistivity values plummeted to 20.4, 32.1, and 45.4 μΩ-cm, respectively. Transmission electron microscope (TEM) analysis revealed that all of the as-annealed films were in the form of an oxygen-deficient oxide/metal composite with layered structure. The resistivity of these oxides is lower than that of indium tin oxide (ITO). They represent a new category of low-resistivity oxides.