Sybille Hopman

Laser-doped silicon solar cells by Laser Chemical Processing (LCP) exceeding 20% efficiency

The introduction of selective emitters underneath the front contacts of solar cells can considerably increase the cell efficiency. Thus, cost-effective fabrication methods for this process step would help to reduce the cost per Wp of silicon solar cells. Laser Chemical Processing (LCP) is based on the waterjet-guided laser (LaserMicroJet®) developed and commercialized by Synova S.A., but uses a chemical jet. This technology is able to perform local diffusions at high speed and accuracy without the need of masking or any high-temperature step of the entire wafer. We present experimental investigations on simple device structures to choose optimal laser parameters for selective emitter formation. These parameters are used to fabricate high-efficiency oxide-passivated LFC solar cells that exceed 20% efficiency.

Passivation-Induced Cavity Defects in Laser-Doped Selective Emitter Si Solar Cells—Formation Model and Recombination Analysis

Laser-induced selective Si doping and simultaneous ablation of a dielectric passivation layer is a promising technology for the creation of efficient and cost-effective solar cells. In this paper, the electrical quality of emitters produced with a 532-nm continuous-wave laser will be discussed using elaborate analysis of quasi-steady-state photoconductance (QSSPC) measurements. It will be shown that these emitters cause good charge carrier shielding, which leads to emitter saturation current densities as low as 240 fA/cm2 for unpassivated surfaces. If an SiNx layer is present during laser doping, the emitter recombination increases by a factor of three. This detrimental effect is put down to the formation of microcavities within the recrystallized Si. A model of the ablation mechanism and cavity formation for long laser pulses is proposed, with the experimental data in this study serving as a limiting case for long irradiation lengths.

Microstructuring and wafering of silicon with laser chemical processing

Laser processing is an important application for fabrication of silicon solar cells, e.g. buried contacts, laser fired contacts or edge isolation. At Fraunhofer ISE a liquid-jet guided laser is used for Laser Chemical Processing (LCP). Both the fundamentals of laser material ablation with this system and the application of various processes for solar cell fabrication are investigated. The applications are divided into two main areas: Microstructuring and deep laser cutting (wafering) of silicon substrates. Microstructuring contains the investigation and characterization of laser induced damage and selective emitter formation for n- and p-type emitters depending on laser parameters and liquid properties. One of the most important and industrially relevant topics at the moment is the formation of a selective highly doped emitter under the metal fingers of solar cells. Wafering deals with the evaluation of suitable laser parameters, adequate chemicals or chemical additives and the understanding of ablation processes by simulation and experimental work. In this presentation newest results concerning n-type doping for varying laser and liquid parameters will be presented with regard to cell efficiency and contact resistance. Furthermore a short overview of promising LCP applications will be given, e.g. p-type doping and wafering.

Reduced feature size and improved quality of liquid jet guided laser processing by controlling the intensity profile

A way to overcome the highly speckled intensity pattern for the liquid jet guided laser processing technique is investigated. Simulations and experiments proof the feasibility of an advantageous “single speckle” pattern.