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Dive into the research topics where T Tom Huiskamp is active.

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Featured researches published by T Tom Huiskamp.


IEEE Transactions on Plasma Science | 2014

Breakdown Voltage and Recovery Rate Estimation of a Supercritical Nitrogen Plasma Switch

J. Zhang; Bert van Heesch; Frank Beckers; T Tom Huiskamp; Guus Pemen

Supercritical fluid (SCF), characterized by high pressure and high density, combines the advantages of gas and liquid: high ability of mass transfer and high heat transfer. SCF has a high potential as an electrical switching medium owing to its high breakdown strength and fast dielectric recovery capability after electrical breakdown. One other significant characteristic of SCF as insulating medium is its low impact to the environment, hence it is proposed as an ideal substitute for SF6-an extreme greenhouse gas in power system circuit breakers. In this paper, the thermodynamic characteristics of SCF are introduced by the review of references. An experimental analysis of electrical breakdown phenomena of a supercritical (SC) plasma switch with pressure up to 180 bar is presented, focusing on the breakdown voltage variation as a function of the fluid pressure, gap width of the electrodes, and fluid flow rate through the gap. A thermodynamic model for recovery rate analysis of a gas insulated switch is proposed and its feasibility is discussed. The model is used to predict the recovery rate of an SC switch.


IEEE Transactions on Plasma Science | 2013

Pulsed Corona Demonstrator for Semi-Industrial Scale Air Purification

Fjcm Frank Beckers; Wflm Wilfred Hoeben; T Tom Huiskamp; Ajm Guus Pemen; van Ejm Bert Heesch

Although pulsed corona technology for air purification is widely investigated by the lab experiments, large-scale application has yet to be proven. Industrial systems require large flow handling and thus, high corona power. An autonomous semi-industrial scale pilot wire-cylinder type corona reactor has been constructed for air purification demonstrations. The reactor is powered by a 10-kW spark gap-based pulsed power supply, capable of generating 60-kV 100-ns wide pulses with 1-kHz repetition rate. The pulses are optionally superimposed on a 0-30-kV dc bias to enable electrostatic precipitation. The system has been successfully applied during several field and lab experiments. Conversion data as a function of energy density are presented for NOx, NH3, H2S, toluene, limonene, and fine dust removal. The system proves feasibility of large-scale air purification by pulsed corona.


Journal of Physics D | 2013

Temperature and pressure effects on positive streamers in air

T Tom Huiskamp; Ajm Guus Pemen; Wflm Wilfred Hoeben; Fjcm Frank Beckers; van Ejm Bert Heesch

In this paper we investigate temperature and pressure effects on the properties of a positive pulsed streamer plasma. We use a corona plasma setup in which we vary the temperature between 303 and 773 K at atmospheric pressure and the pressure between 37.9 and 100 kPa at room temperature to achieve the same neutral gas density and compare electrical and optical (ICCD imaging) measurements carried out in both experiments.From the measurements we found that the dissipated plasma energy and the average streamer propagation velocity are both higher for the temperature experiments at the same neutral gas densities as in the pressure experiments. This suggests the existence of a specific temperature effect. A possible explanation for this effect is a higher streamer conductivity at high temperatures, as was previously found in the literature.


IEEE Transactions on Plasma Science | 2014

Design of a Subnanosecond Rise Time, Variable Pulse Duration, Variable Amplitude, Repetitive, High-Voltage Pulse Source

T Tom Huiskamp; Sj Stefan Voeten; van Ejm Bert Heesch; Ajm Guus Pemen

In this paper, we present a design approach of a single-line nanosecond pulse source by using a thorough analytical investigation and by verification with CST MICROWAVE STUDIO. Through detailed analysis and simulation, we arrive at a design for a fast rise time variable pulse duration pulse source which is able to produce 1-10 ns pulses with tens of kilovolt amplitude and less than hundreds of picoseconds rise time. This variable pulse duration is achieved by using telescopic antennas and ferrites in the pulse-forming line of the pulse source. Finally, we present a first implementation of a 5-ns pulse source with an oil spark gap for fast switching.


Plasma Chemistry and Plasma Processing | 2016

Experimental Investigation on the Effect of a Microsecond Pulse and a Nanosecond Pulse on NO Removal Using a Pulsed DBD with Catalytic Materials

Vr Vindhya Chirumamilla; Wflm Wilfred Hoeben; Fjcm Frank Beckers; T Tom Huiskamp; van Ejm Bert Heesch; Ajm Guus Pemen

In this study, an experimental investigation of the removal of NO from an atmospheric air stream has been carried out with a non-thermal plasma dielectric barrier discharge reactor filled with different catalytic materials. TiO


IEEE Transactions on Plasma Science | 2014

Final Implementation of a Subnanosecond Rise Time, Variable Pulse Duration, Variable Amplitude, Repetitive, High-Voltage Pulse Source

T Tom Huiskamp; Fjcm Frank Beckers; van Ejm Bert Heesch; Ajm Guus Pemen


IEEE Transactions on Plasma Science | 2014

Visualization of a Coaxial Dielectric Barrier Discharge Driven by a Sub-ns Rising High-Voltage Pulse and Its Reflections

H Hans Hoft; T Tom Huiskamp; M Kettlitz; Ajm Guus Pemen

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IEEE Transactions on Plasma Science | 2012

Maskless Patterning by Pulsed-Power Plasma Printing

T Tom Huiskamp; Wjm Wouter Brok; Aae Alquin Stevens; van Ejm Bert Heesch; Ajm Guus Pemen


ieee sensors | 2016

B-Dot and D-Dot Sensors for (Sub)Nanosecond High-Voltage and High-Current Pulse Measurements

T Tom Huiskamp; Fjcm Frank Beckers; van Ejm Bert Heesch; Ajm Guus Pemen

2, CuO–MnO


IEEE Transactions on Plasma Science | 2013

A Solid-State 0–120 kV Microsecond Pulse Charger for a Nanosecond Pulse Source

T Tom Huiskamp; Fjcm Frank Beckers; van Ejm Bert Heesch; Ajm Guus Pemen

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Ajm Guus Pemen

Eindhoven University of Technology

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A.J.M. Pemen

Eindhoven University of Technology

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Fjcm Frank Beckers

Eindhoven University of Technology

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van Ejm Bert Heesch

Eindhoven University of Technology

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F.J.C.M. Beckers

Eindhoven University of Technology

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Wflm Wilfred Hoeben

Eindhoven University of Technology

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E.J.M. van Heesch

Eindhoven University of Technology

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W.F.L.M. Hoeben

Eindhoven University of Technology

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J. Zhang

Eindhoven University of Technology

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Sj Stefan Voeten

Eindhoven University of Technology

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