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Dive into the research topics where Takafumi Okuma is active.

Publication


Featured researches published by Takafumi Okuma.


Journal of The Society for Information Display | 2008

High-performance MgO thin films for PDPs with a high-rate sputtering-deposition process

Masaharu Terauchi; Jun Hashimoto; Hikaru Nishitani; Yusuke Fukui; Michiko Okafuji; Hitoshi Yamashita; Hiroshi Hayata; Takafumi Okuma; Hitoshi Yamanishi; Mikihiko Nishitani; Masatoshi Kitagawa

— A high-rate sputtering-deposition process for MgO thin films for PDP fabrication was recently developed. The deposition rate of the MgO thin film was about 300 nm/min which shows the possibility of production-line application. The MgO film deposited in this work has a higher density than that of other deposition processes such as electron-beam deposition and shows good discharge characteristics including firing voltage and discharge formation. These were achieved by controlling the stoichiometry and/or the impurity doping during the sputtering process.


IEEE Transactions on Plasma Science | 2018

Effects of the Driving Frequency on Temperature in a Multiphase AC Arc

Takafumi Okuma; Hiroki Maruyama; Taro Hashizume; Manabu Tanaka; Takayuki Watanabe; Hisao Nagai; Takeshi Koiwasaki; Hiroshi Nasu

Effects of the driving frequency on temperature in a multiphase ac arc were successfully clarified. A multiphase ac arc is one of the thermal plasmas, which is suitable for producing functional materials such as nanoparticles, in-flight glass melting, and waste treatment in terms of its large plasma volume, high-energy efficiency, and low flow velocity. The temperature and arc behavior in various driving frequencies were investigated by the observation system consisting of a high-speed video camera and bandpass filters for plasma spectroscopy. The temperature measurement was conducted on the basis of the Boltzmann plot method. The obtained results indicated that the arc behavior and its temperature field were strongly influenced by the driving frequency. An increase of the frequency led to concentrated arc region, higher arc temperature at the center of electrode region and lower arc fluctuation. The temperature and its distribution can be controlled depending on the material properties to be treated and the purpose of the process.


Archive | 2002

Circuit substrate and its manufacturing method

Takaaki Higashida; Takafumi Okuma; Daisuke Suetsugu; Seiji Nakashima; Kenichi Yamamoto; Munekazu Nishihara; Kenichi Sato


Archive | 2009

METHOD FOR FORMING THROUGH ELECTRODE AND SEMICONDUCTOR DEVICE

Takayuki Kai; Kazushi Higashi; Takeshi Kita; Hitoshi Yamanishi; Takafumi Okuma


Archive | 2004

Plasma display panel and process for producing the same and thin film

Tomohiro Okumura; Mitsuo Saitoh; Masashi Morita; Takafumi Okuma; Masaharu Terauchi; Junko Asayama


Archive | 2007

Plasma display panel and process for producing the plasma display panel

Tomohiro Okumura; Mitsuo Saitoh; Masashi Morita; Takafumi Okuma; Masaharu Terauchi; Junko Asayama


Archive | 2006

Deposition method by physical vapor deposition and target for deposition processing by physical vapor deposition

Hideki Yamashita; Takafumi Okuma; Hiroshi Hayata; Hitoshi Yamanishi; Tadashi Kimura; Hirokazu Nakaue


Archive | 2004

Plasma display panel, manufacturing method of the same, and thin film

Junko Asayama; Masafumi Morita; Takafumi Okuma; Tomohiro Okumura; Mitsuhisa Saito; Masaharu Terauchi; 崇文 大熊; 正治 寺内; 純子 朝山; 雅史 森田; 光央 齋藤


Archive | 2002

Multilayer wiring board and method and device for manufacturing the same

Takaaki Higashida; Seiji Nakajima; Munekazu Nishihara; Takafumi Okuma; Daisuke Suetsugu; Kenichi Yamamoto; 誠二 中嶋; 崇文 大熊; 憲一 山本; 大輔 末次; 隆亮 東田; 宗和 西原


Archive | 2002

THIN TYPE CIRCUIT BOARD AND METHOD FOR MANUFACTURING THE SAME

Takaaki Higashida; Takafumi Okuma; Daisuke Suetsugu; Seiji Nakashima; Kenichi Yamamoto; Munekazu Nishihara; Kenichi Sato

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