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Dive into the research topics where Takahiro Satoh is active.

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Featured researches published by Takahiro Satoh.


Japanese Journal of Applied Physics | 2010

Micrometer-Sized Magnetic Patterning of FeRh Films Using an Energetic Ion Microbeam

Naoki Fujita; T. Matsui; Shinya Kosugi; Takahiro Satoh; Yuichi Saitoh; Katsuyoshi Takano; Masashi Koka; Tomihiro Kamiya; Shuhei Seki; Akihiro Iwase

FeRh thin films were irradiated with a focused 10 MeV I 2 ×2 µm2 ion microbeam at intervals of several µm. Following irradiation, the magnetic state at the surface was observed via magnetic force microscopy. The micrometer-sized regions irradiated with the microbeam show a ferromagnetic state while unirradiated regions remain in an anti-ferromagnetic state. Results indicate that an energetic ion microbeam can be used as a tool to produce micrometer-sized modulations of lateral magnetic states of FeRh films.


Applied Radiation and Isotopes | 2009

Development of micromachining technology in ion microbeam system at TIARA, JAEA

Tomihiro Kamiya; Hiroyuki Nishikawa; Takahiro Satoh; J. Haga; Masakazu Oikawa; Yasuyuki Ishii; Takeru Ohkubo; N. Uchiya; Y. Furuta

An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.


Applied Radiation and Isotopes | 2009

Characteristics of focusing high-energy heavy ion microbeam system at the JAEA AVF cyclotron

Masakazu Oikawa; Takahiro Satoh; Tomihiro Kamiya; Satoshi Kurashima; Susumu Okumura; Nobumasa Miyawaki; Hirotsugu Kashiwagi; Mitsuhiro Fukuda; T. Sakai; Watalu Yokota

Ion optical analysis was made for a new focusing high-energy heavy ion microbeam system connected to the AVF cyclotron (K=110) at the accelerator facility, TIARA of JAEA Takasaki. The focusing performance of the microbeam system was estimated from both the calculation up to third-order term using TRANSPORT code and the measurement of beam resolution with the secondary electron imaging. As a result, a minimum beam size was evaluated at 0.56 and 0.62 microm in FWHM for the X and Y directions, respectively. The high-energy heavy ion microbeam system seemed to have been established as designed by the calculation with the TRANSPORT code, because it was confirmed that the calculation results was fairly reproduced by the measurement result.


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2007

Focusing high-energy heavy ion microbeam system at the JAEA AVF cyclotron

Masakazu Oikawa; Takahiro Satoh; T. Sakai; Nobumasa Miyawaki; Hirotsugu Kashiwagi; Satoshi Kurashima; Susumu Okumura; Mitsuhiro Fukuda; Watalu Yokota; Tomihiro Kamiya


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2011

Microbeam complex at TIARA: Technologies to meet a wide range of applications

Tomihiro Kamiya; Katsuyoshi Takano; Takahiro Satoh; Yasuyuki Ishii; Hiroyuki Nishikawa; Shu Seki; Masaki Sugimoto; Susumu Okumura; M. Fukuda


Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 2009

Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

Tomihiro Kamiya; Katsuyoshi Takano; Yasuyuki Ishii; Takahiro Satoh; Masakazu Oikawa; Takeru Ohkubo; J. Haga; Hiroyuki Nishikawa; Y. Furuta; N. Uchiya; Shu Seki; Masaki Sugimoto


Transactions-Materials Research Society of Japan | 2011

Nano-micro Processing of Epoxy Resin Systems by Ion Beam Lithography with Multiple Energies and Species

Katsuyoshi Takano; Takahiro Satoh; Yasuyuki Ishii; Masashi Koka; Tomihiro Kamiya; Takeru Ohkubo; Masaki Sugimoto; Hiroyuki Nishikawa; Shu Seki


27th International Conference of Photopolymer Science and Technology (ICPST-27) | 2010

Curing Reaction of SU-8 Negative-type Photoresist by MeV Ion Beam Lithography

Katsuyoshi Takano; Tomihiro Kamiya; Masaki Sugimoto; Shuhei Seki; Takahiro Satoh; Yasuyuki Ishii; Takeru Ohkubo; Masashi Koka; Hiroyuki Nishikawa


12th International Conference on Nuclear Microprobe Technology and Applications, Book of Abstracts | 2010

Microbeam Complex in TIARA: Technologies to Meet Wide Range of Applications

Tomihiro Kamiya; Katsuyoshi Takano; Takahiro Satoh; Yasuyuki Ishii; Susumu Okumura; Hiroyuki Nishikawa; Shu Seki; Masaki Sugimoto; W. Yokota; Mitsuhiro Fukuda


12th International Conference on Nuclear Microprobe Technology and Applications, Book of Abstracts | 2010

Controlling Spatial Curing Reactions of Epoxy Resin Systems on Ion Beam Writing

Katsuyoshi Takano; Takahiro Satoh; Masashi Koka; Tomihiro Kamiya; Yasuyuki Ishii; Takeru Ohkubo; Masaki Sugimoto; Hiroyuki Nishikawa; Shu Seki

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Tomihiro Kamiya

Japan Atomic Energy Agency

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Hiroyuki Nishikawa

Shibaura Institute of Technology

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Masaki Sugimoto

Japan Atomic Energy Agency

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Takeru Ohkubo

Japan Atomic Energy Agency

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Masashi Koka

Japan Atomic Energy Agency

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Masakazu Oikawa

Japan Atomic Energy Agency

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Susumu Okumura

Japan Atomic Energy Agency

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