Takanori Maruo

Mesoporous aluminosilicates assembled from dissolved LTA zeolite and triblock copolymer in the presence of tetramethylammonium hydroxide.

Zeolite Na-A crystals dissolved in a HCl solution were used as a single-source of silicon and aluminum for the synthesis of mesoporous aluminosilicates via a template-assisted method with an organic base tetramethylammonium hydroxide (TMAOH). Amphiphilic triblock copolymer Pluronic F127 (EO(106)PO(70)EO(106)) was used as template. Increasing the amount of TMAOH in the synthetic solution resulted in an increase in the aluminum content of the products. On the other hand, mesostructural periodicity was deteriorated with higher content of aluminum incorporated into the mesoporous framework. The samples with low Si/Al ratios less than 5 have wormhole-like pore structure, while the samples with Si/Al ratios more than 7 possess highly ordered mesoporous structure, a body-centered Im3m symmetry, with single crystal like morphology. The samples with Si/Al ratio of 7, which prepared at TMAOH molar concentration of 25 mM in the templating solution, possess BET surface area of 470 m(2)/g, pore size of 6.4 nm, and pore volume of 0.56 cm(3)/g. Aluminum atoms have successfully been incorporated in a tetra-coordinated position and remained stable even after calcination at 600 degrees C.

Synthesis of 3D pore mesostructured silica films by vapor infiltration of tetraethoxysilane

Nonionic alkyl poly(oxyethylene) surfactants (Brij 56) films on a silicon substrate were treated with a tetraethoxysilane (TEOS) vapor. Mesostructured silica films were formed through a nano-phase transition under the infiltration of TEOS into the surfactant films. It was found that the calcined film had a 3D pore structure from the field emission scanning electron microscope (FE-SEM) observations in a different orientation. Grazing angle of incidence small angle X-ray scattering (GISAXS) measurement results showed that the symmetry of the film was an Fmmm space group oriented with the (010) plane parallel to the surface. The ordered structure of the films showed higher thermal stability than the films prepared by a conventional solvent-evaporation method.

Vapor phase synthesis of mesoporous silica thin films with a 3D pore structure

Abstract Ordered mesoporous silica thin films were prepared using non-ionic alkyl poly(oxyethylene) surfactants (Brij56: C18EO10) by a vapor phase method. First, a Brij56/H2SO4 composite was deposited on a silicon substrate by spin-coating. The Brij56 film was treated with a tetraethoxysilane (TEOS) and hydrochloric acid (HCl) vapors in a closed vessel. The TEOS and HCl vapors were infiltrated into the film, resulted in a formation of the silica network. Results of a grazing angle of incidence small angle X-ray scattering (GISAXS) show that the films have an ordered structure with an Fmmm symmetry. From an Field emission scanning electron microscope (FESEM) observations, the film has a 3D pore structure.