Takanori Shirai

Sputtering target for forming magnetic recording film, and its production method

METHOD FOR PRODUCING CoCrPt-SIO2 SPUTTERING TARGET FOR DEPOSITING MAGNETIC RECORDING FILM

Sputtering target for forming film of perpendicular magnetic recording medium having low relative permeability

Sputtering target for forming magnetic recording film having reduced generation of particle

Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM WHICH IS LESS LIKELY TO GENERATE PARTICLE

SINTERED-COMPACT TARGET WITH EXCELLENT RESISTANCE TO CRACKING DUE TO SPUTTERING FOR USE IN DEPOSITION OF PROTECTIVE FILM FOR OPTICAL RECORDING MEDIUM, AND ITS MANUFACTURING METHOD

W-Ti DIFFUSION-PREVENTING FILM HAVING HIGH ETCHING RATE, AND W-Ti TARGET FOR SPUTTERING FOR FORMING THE SAME

Raw material powder for sintered compact target for forming optical recording medium protective film, method of producing sintered compact target using the powder, and sintered compact target

METHOD FOR MANUFACTURING Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMATION OF MAGNETIC RECORDING FILM WHICH IS LESS LIKELY TO GENERATE PARTICLE

METHOD FOR MANUFACTURING SPUTTERING TARGET TO BE USED IN FORMING FILM OF PERPENDICULAR MAGNETIC RECORDING MEDIUM HAVING LOW RELATIVE MAGNETIC PERMEABILITY IN IN-PLANE DIRECTION