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Dive into the research topics where Takashi Ishigami is active.

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Featured researches published by Takashi Ishigami.


IEEE Transactions on Magnetics | 1997

Composition change in magnetron-sputtered Fe-Zr-N film with erosion of Fe-Zr alloy target

Katsutaro Ichihara; Koichi Tateyama; Ryo Sakai; Takashi Ishigami

The composition of magnetron-sputtered Fe-Zr-N films is found to change with the erosion of the high-permeability Fe-Zr alloy target. Zr is preferentially sputtered parallel to the target surface, and this tendency is more pronounced as erosion increases, Incident ion energy decreases with erosion because the leakage magnetic flux intensity increases, and the plasma density increases as a result of enhanced ionization frequency. This composition change has been attributed to a reflective collision process becoming dominant as the incident ion energy decreases with increasing erosion. A novel mosaic-type target, consisting of both alloy and single-element phases, has been developed, and the composition change is successfully suppressed and compositional uniformity is markedly improved.


Archive | 1995

Light-shielding film, useable in an LCD, in which fine particles of a metal or semi-metal are dispersed in and throughout an inorganic insulating film

Hideo Hirayama; Nobuki Ibaraki; Koji Hidaka; Kiyotsugu Mizouchi; Michiya Kobayashi; Takashi Ishigami; Ryo Sakai; Makoto Kikuchi


Archive | 2002

Sputtering target for recording medium and magnetic recording medium

Hisanori Aikawa; Junichi Akiyama; Naomi Fujioka; Takashi Ishigami; Tadashi Kai; Satoru Kikitsu; Tomoyuki Maeda; Toshihiko Nagase; Yukinobu Suzuki; Koichi Watanabe; Takashi Watanabe; 知幸 前田; 哲 喜々津; 俊彦 永瀬; 高志 渡辺; 光一 渡邊; 正 甲斐; 尚徳 相川; 隆 石上; 純一 秋山; 直美 藤岡; 幸伸 鈴木


Archive | 1996

Wiring film, sputter target for forming the wiring film and electronic component using the same

Takashi Ishigami; Toshihiro Maki; Akihisa Nitta; Koichi Watanabe; Noriaki Yagi


Archive | 1991

Highly purified metal material and sputtering target using the same

Takashi Ishigami; Minoru Obata; Mituo Kawai; Michio Satou; Takashi Yamanobe; Toshihiro Maki; Noriaki Yagi; Shigeru Ando


Archive | 1999

Sputtering target and its manufacture

Shigeru Ando; Takashi Ishigami; Mitsuo Kawai; Toshihiro Maki; Minoru Obata; Michio Sato; Noriaki Yagi; Takashi Yamanobe; 道雄 佐藤; 典章 八木; 茂 安藤; 稔 小畑; 尚 山野辺; 光雄 河合; 利広 牧; 隆 石上


Archive | 1996

Magnetron sputtering method and sputtering target

Katsutaro Ichihara; Kohichi Tateyama; Ryo Sakai; Takashi Ishigami


Archive | 1997

Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same

Takashi Yamanobe; Naomi Fujioka; Takashi Ishigami; Nobuo Katsui; Hiromi Fuke; Kazuhiro Saito; Hitoshi Iwasaki; Masashi Sahashi; Takashi Watanabe


Archive | 1996

Interconnector line of thin film, sputter target for forming the wiring film and electronic component using the same

Takashi Ishigami; Koichi Watanabe; Akihisa Nitta; Toshihiro Maki; Noriaki Yagi


Archive | 1987

Highly pure titanium and process for producing the same

Kazumi Shimotori; Yoshiharu Ochi; Hideo Ishihara; Takenori Umeki; Takashi Ishigami

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