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Takashi Minemoto

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Publication

Featured researches published by Takashi Minemoto.

Archive | 2003

Manufacturing method of group iii nitride substrate, and semiconductor device

Akihiko Ishibashi; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; 康夫 北岡; 尚 峯本; 勲 木戸口; 明彦 石橋

Archive | 2003

Method for fabricating nitride substrate of group 3 element

Akihiko Ishibashi; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; 康夫 北岡; 尚 峯本; 勲 木戸口; 明彦 石橋

Archive | 2004

Method for manufacturing nitride crystal of group iii element, nitride crystal of group iii element obtained by the same, and semiconductor device obtained by using the same

Akihiko Ishibashi; Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; 孝友 佐々木; 康夫 北岡; 尚 峯本; 史朗 川村; 勲 木戸口; 勇介 森; 明彦 石橋

Archive | 2004

Production method of group iii nitride substrate, group iii nitride substrate produced thereby, and semiconductor device and production method thereof

Akihiko Ishibashi; Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; 孝友 佐々木; 康夫 北岡; 尚 峯本; 史朗 川村; 勲 木戸口; 勇介 森; 明彦 石橋

Archive | 2004

Method for producing group iii nitride substrate, and semiconductor device

Akihiko Ishibashi; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; 康夫 北岡; 尚 峯本; 勲 木戸口; 明彦 石橋

Archive | 2004

Manufacturing method of group iii nitride crystal substrate and etchant used for the same and, group iii nitride crystal substrate and semiconductor element using the same

Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; 孝友 佐々木; 康夫 北岡; 尚 峯本; 史朗 川村; 勲 木戸口; 勇介 森

Archive | 2004

METHOD OF MANUFACTURING GaN CRYSTAL AND GaN CRYSTAL SUBSTRATE, GaN CRYSTAL AND GaN CRYSTAL SUBSTRATE OBTAINED BY THE METHOD, AND SEMICONDUCTOR DEVICE INCLUDING THE SAME

Shiro Kawamura; Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Masanori Morishita; Takatomo Sasaki; 孝友 佐々木; 康夫 北岡; 尚 峯本; 史朗 川村; 勲 木戸口; 勇介 森; 昌紀 森下

Archive | 2004

Group iii nitride single crystal wafer and method for manufacturing semiconductor device using same

Isao Kidoguchi; Yasuo Kitaoka; Takashi Minemoto; 康夫 北岡; 尚 峯本; 勲 木戸口

Archive | 2007

PRODUCTION METHOD OF GROUP III ELEMENT NITRIDE CRYSTAL AND GROUP III ELEMENT NITRIDE CRYSTAL

Takeshi Hatayama; Koichi Hiranaka; Shiro Kawamura; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; Osamu Yamada; 孝友 佐々木; 康夫 北岡; 修 山田; 尚 峯本; 史朗 川村; 弘一 平中; 勇介 森; 健 畑山

Archive | 2010

Method for producing group iii element nitride crystal, group iii element nitride crystal, substrate for forming semiconductor device and semiconductor device

Takeshi Hatayama; Koichi Hiranaka; Shiro Kawamura; Yasuo Kitaoka; Takashi Minemoto; Yusuke Mori; Takatomo Sasaki; Osamu Yamada; 孝友 佐々木; 康夫 北岡; 修 山田; 尚 峯本; 史朗 川村; 弘一 平中; 勇介 森; 健 畑山

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Collaboration

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Yasuo Kitaoka

Osaka University

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Isao Kidoguchi

Panasonic

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Takatomo Sasaki

Nagoya University

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Yusuke Mori

Nikon

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Osamu Yamada

Osaka Sangyo University

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Akihiko Ishibashi

Panasonic

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Masanori Morishita

Osaka University

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Kazuyoshi Tsukamoto

Panasonic

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Masashi Yoshimura

Nikon

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Yasunori Kai

Osaka University

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