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Featured researches published by Takashi Soma.


Applied Optics | 1977

Scanning moiré method and automatic measurement of 3-D shapes.

Masanori Idesawa; Toyohiko Yatagai; Takashi Soma

A new type of moiré and its application to topography are discussed. moiré fringes are generated by observing a grating projected on an object under test with a scanning imaging device. The general equations of the projection-type moiré topography are given. By controlling the phase, the pitch, or the direction of the virtual grating corresponding to the scanning lines of the imaging device, the automatic sign determination of the contour lines is accomplished. By the use of a high precision flying spot scanner with CRT(DD-tube) and a minicomputer system, an experimental measurement system is developed. Very significant is the fact that a contour line system and a sectional shape of the object are automatically reconstructed and displayed on a color TV monitor.


Journal of Vacuum Science and Technology | 1978

Design of a variable‐aperture projection and scanning system for electron beam

Eiichi Goto; Takashi Soma; Masanori Idesawa

Results of design calculations of a variable‐aperture projection and scanning exposure system is presented. Use is made of newly developed aberration formulas for the focus deflection system, which can handle systems consisting of a set of focus and deflection coils with superimposed fields and of deflection coils arranged in rotated angular positions, taking into account the finiteness of the object. The aberration of less than 0.2 μm and the incident angle less than 1 mrad with the normal, at the corners of a 5×5 mm deflection field, is expected for the 25 μm (maximum) square and 3 mrad semi‐angle probe, in the linear MOL deflector, with object to image distange of 100 mm, consisting of only an axially symmetric lens and five linear deflectors without dynamic corrections.


international conference on functional programming | 1982

Design of a Lisp machine - FLATS

Eiichi Goto; Takashi Soma; Nobuyuki Inada; Tetsuo Ida; Masanori Idesawa; Kei Hiraki; Masayuki Suzuki; Kentaro Shimizu; B. Philipov

Design of a 10 MIPS Lisp machine used for symbolic algebra is presented. Besides incorporating the hardware mechanisms which greatly speed up primitive Lisp operations, the machine is equipped with parallel hashing hardware for content addressed associative tabulation and a very fast multiplier for speeding up both arithmetic operations and fast hash address generation.


IEEE Transactions on Electromagnetic Compatibility | 1987

Optimization of Anisotropic Magnetic Shielding

Eiichi Goto; Takashi Soma

The concept of anisotropy is introduced in a laminar structure of magnetic sheet and the condition for minimum volume and maximum effectiveness of the magnetic shield of a spherical shell is investigated. The advantage of this structure over the conventional layered structure is shown. Figures and tables of this condition for typical shielding factor and permeability values are given.


international conference on pattern recognition | 1988

Analysis and manipulation methods of geographic informations

Kang Cheng; Masanori Idesawa; Takashi Soma

Geographic-feature extraction methods based on a mesh data model, covering a wide range of features such as surface area, solid volume, slope features, and ridge valley features are proposed. These methods can be applied also for change analysis between multiterm models for a specific area. By analyzing two models measured in different time in the same area, some dynamic informations about the change during the period has been quantitatively and qualitatively obtained.<<ETX>>


Nuclear Instruments and Methods | 1975

A new type of cathode ray tube suitable for bubble chamber film measurements

Shinkichi Shibata; Takashi Soma; Eiichi Goto; Atsuo Ono

Abstract A newly developed high precision cathode ray tube based on a novel electron-optical system is described. In the tube, a matrix of short focused electron lenses is placed in front of and in parallel to the screen. The incident position and direction of the electron beam to the matrix lens are controlled independently using two sets of deflectors placed between the matrix lens and the electron gun. A tube having better than one part in 12 000 addressing accuracy is achieved by employing an open loop (feedback-free) correction scheme. The spot size is about 25 μm and the effective area is about 60×60 mm 2 .


Journal of Robotic Systems | 1986

A study on robot path planning from a solid model

Y. Itoh; Masanori Idesawa; Takashi Soma

CAD/CAM technologies have been developed and are beginning to penetrate rapidly into industries. At present, however, there are many problems that should be solved before CAD/CAM technologies can play their proper role in the total process. In an effort to improve CAD/CAM current circumstances, a trial CAE system which generates an operation path of a robot from a solid-model built-in CAD process, has been examined. In this system, solid models are built by performing set operations such as addition, subtraction, intersection between several primitives or solid models. Processing is made for a solid model represented by B-rep (boundary representation). To ease the processing, curved faces such as spherical, cylindrical, or conical surfaces, are approximated by several flat planes. As a first step, by assuming Gaussian spatial distribution for a painting gun, path planning of a painting robot for a convex solid body has been examined. A scanning plane is defined for each flat plane and a path of robot effector is generated on this plane.


Journal of Vacuum Science and Technology | 1981

Considerations on space charge effect for high current variable shaped beam forming

Masanori Idesawa; Takashi Soma; Eiichi Goto; Tateaki Sasaki

Variable shaped beam schemes are very promising for advanced VLSI pattern generation. In such a device, beam blurring caused by the space charge effect becomes greater as the beam current increases and the focal length of the electron lens is varied as the beam current changes. In order to keep the beam blurring within a permissible amount, refocusings are required whenever beam sectional areas are changed dramatically. However, it is often difficult to complete refocusing in negligible short time in comparison with the shot time of an element pattern and total exposure time is influenced considerably. Investigating the results of computer simulations and fundamental experiments, it is found that beam blurring caused by defocusing is almost proportional to the deviation of the beam current from that at the optimum focusing point and is kept under the permissible value in certain intervals of beam current. Considering this characteristic, the defocusing problem can be improved significantly by rearranging ...


Journal of Vacuum Science and Technology | 1981

Discontinuity reduction method in pattern connection

Masanori Idesawa; Takashi Soma; Eiichi Goto

A method of reducing the discontinuities which appear in the connecting boundaries of element patterns or in the stitching boundaries of sub‐scanning‐fields is proposed. Pattern elements are overlapped in the connecting region, and the beam dose in the overlapping area of each pattern element is controlled so that they are compensated by each other. Computer simulations and experiments were performed proving that the proposed method is very effective in reducing these discontinuities. For instance, by selecting an overlapping area which is several times wider than the expected positioning errors or edge definition of element pattern, discontinuities in pattern connection can be reduced remarkably without any special improvement of positioning accuracy.


Journal of Vacuum Science and Technology | 1979

Triple slit scheme for high current variable‐shaped beam forming

Masanori Idesawa; Eiichi Goto; Takashi Soma; Tateaki Sasaki

Variable‐shaped beam schemes are very promising for advanced VLSI pattern generation. Some of them are made up of two beam shaping apertures, beam shaping deflectors, and projection lenses. In such devices, exposure speed is proportional to the total beam current finally projected onto the target. When the beam current is increased in this scheme, beam blurring caused by space charge effect becomes greater as the beam current increases. The observed beam blurring becomes much greater on the edges corresponding to the sides of the first beam shaping aperture than on those of the second one. A new beam shaping scheme is proposed for reducing this blurring. In this scheme, auxiliary beam shaping means are provided in the upper stream of the previously developed beam shaping system. The beam is preshaped by the new scheme so as to reduce the beam current between the first and the second beam shaping apertures by an amount which is the sum of the finally required and marginal portions, and a clearer beam shape...

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