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Dive into the research topics where Takayasu Komatsu is active.

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SID Symposium Digest of Technical Papers | 1999

Ultra Fine Aperture Grille for CDTs

Akira Makita; Takayasu Komatsu; Koji Fujiyama; Y. Ishii; Daisuke Hashimoto

A new method for producing ultra fine aperture grilles for CDTs has been developed. This new approach can produce 0.125mm pitch aperture grille for 21-in 200-dpi ultra fine CDTs while providing the same optical transmittance and white uniformity as those of conventional ones. Good narrow aperture performance is combined with an excellent smoothness of grille edges. This technology also allows a range of finer pitch shadowmasks as well as aperture grilles to be made practical for further high resolution CDTs.


Archive | 1997

Liquid application method and application apparatus

Takayasu Komatsu; Shunji Miyakawa; Kazuo Watanabe


Archive | 1994

Method of and apparatus for application of liquid.

Takayasu Komatsu; Shunji Miyakawa; Kazuo Watanabe


Archive | 2003

Etching substrate material, etching process and article obtained by etching

Takayasu Komatsu; Daisuke Hashimoto; Akira Makita; Koji Fujiyama


Archive | 2004

Shadow mask, plate member therefor and method of manufacturing shadow mask

Takayasu Komatsu; Hiromitsu Ochiai; Akira Makita; Hirofumi Hideshima; Takuya Ogio; Toshimu Watanabe


Archive | 2005

Shadow mask for a cathode ray tube

Takayasu Komatsu; Hirofumi Hideshima; Akira Makita; Yutaka Matsumoto; Takuya Ogio


Archive | 1994

Verfahren und vorrichtung zum flüssigkeitsauftrag.

Takayasu Komatsu; Shunji Miyakawa; Kazuo Watanabe


Archive | 2001

Shadow mask, shadow mask web, and manufacture of the shadow mask

Takafumi Hideshima; Takayasu Komatsu; Akira Makita; Hiromitsu Ochiai; Takuya Ogio; Toshitake Watanabe; 隆泰 小松; 俊武 渡邊; 明 牧田; 啓文 秀島; 卓也 荻尾; 洋光 落合


Archive | 1998

Metal substrate, to be etched through a resist pattern, has a smooth surface with specified roughness values

Takayasu Komatsu; Daisuke Hashimoto; Akira Makita; Koji Fujiyama


Archive | 1994

Verfahren und vorrichtung zum flüssigkeitsauftrag Method and device for liquid-order

Takayasu Komatsu; Shunji Miyakawa; Kazuo Watanabe

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