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Dive into the research topics where Takeshi Kawashima is active.

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Featured researches published by Takeshi Kawashima.


Applied Physics Letters | 2010

GaN-based surface-emitting laser with two-dimensional photonic crystal acting as distributed-feedback grating and optical cladding

Shoichi Kawashima; Takeshi Kawashima; Yasuhiro Nagatomo; Yuichiro Hori; Hideo Iwase; Takeshi Uchida; Katsuyuki Hoshino; Aihiko Numata; Mamoru Uchida

We demonstrate GaN-based distributed-feedback surface-emitting lasers grown on sapphire substrates with a two-dimensional (2D) square-lattice photonic crystal (PhC) that forms a high-aspect-ratio void array (void diameter: 65 nm and depth: 220 nm). The 2D PhC layer acts as both distributed-feedback grating and p-type optical cladding of a separate confinement heterostructure. To form the 2D PhC in the nitride semiconductor layers, we developed an embedding process that uses mass-transport phenomena. Crystallographic facets appeared on the inner walls of the embedded voids. Room-temperature lasing action was observed at 406.0 nm for a PhC lattice constant of 162.5 nm. The threshold current density was 9.7 kA/cm2 for a 120-μm-square p-contact electrode.


Applied Physics Express | 2012

Fine Crystallographic Facets of Photonic Crystal Voids Embedded in GaN-Based Semiconductor by Mass Transport

Takeshi Kawashima; Shoichi Kawashima; Yasuhiro Nagatomo; Yuichiro Hori; Hideo Iwase; Takeshi Uchida; Aihiko Numata; Katsuyuki Hoshino; Mamoru Uchida

We developed a technique for fabricating photonic crystal (PhC) voids embedded in GaN by dry etching, mass transport, and annealing. We report the annealing conditions and shape of the embedded PhC voids. After dry etching to pattern PhC air holes, they are fully capped with a flat GaN layer (34 nm thick) by annealing at 1025 °C. Inner void walls exhibit GaN crystallographic facets. Upon annealing at 900 °C, the air holes are not capped and instead become narrower with increasing annealing duration. Hence, both the shape and diameter can be controlled in the fabrication of PhC structures in GaN.


international semiconductor laser conference | 2010

GaN-based distributed-feedback surface-emitting laser with embedded two-dimensional photonic crystal fabricated by mass-transport technique

Yasuhiro Nagatomo; Shoichi Kawashima; Takeshi Kawashima; Yuichiro Hori; Hideo Iwase; Takeshi Uchida; Aihiko Numata; Katsuyuki Hoshino; Mamoru Uchida

We report on GaN-based distributed-feedback surface-emitting lasers on a sapphire substrate. Two-dimensional photonic crystal gratings in our device were embedded into GaN-based structures by mass-transport phenomena. We have observed room-temperature pulsed lasing at 406.0 nm.


Archive | 2010

Process for producing semiconductor device and semiconductor device

Yasuhiro Nagatomo; Takeshi Kawashima; Katsuyuki Hoshino; Shoichi Kawashima


Archive | 2010

MANUFACTURING METHOD OF MICROSTRUCTURE

Takeshi Kawashima; Katsuyuki Hoshino; Shoichi Kawashima; Yasuhiro Nagatomo


Archive | 2010

Method of producing microstructure of nitride semiconductor and photonic crystal prepared according to the method

Shoichi Kawashima; Takeshi Kawashima; Yasuhiro Nagatomo; Katsuyuki Hoshino


Archive | 2014

SEMICONDUCTOR DBR, SEMICONDUCTOR LIGHT-EMITTING DEVICE, SOLID-STATE LASER, PHOTOACOUSTIC APPARATUS, IMAGE-FORMING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DBR

Takeshi Kawashima


Archive | 2013

NITRIDE SEMICONDUCTOR SURFACE EMITTING LASER AND METHOD OF MANUFACTURING THE SAME

Takeshi Kawashima


Archive | 2016

Nitride semiconductor light-emitting device with a layer containing In and Mg and method for producing the same

Takeshi Kawashima


Archive | 2012

DISTRIBUTED FEEDBACK SURFACE EMITTING LASER

Yasuhiro Nagatomo; Takeshi Kawashima

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