Tea Young Lee

High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma

Etch characteristics of CoFeB magnetic thin films using high density plasma of a H2O/CH4/Ar gas mixture

Characteristics of CdS thin films deposited on glass and Cu(In,Ga)Se2 layer using chemical bath deposition

Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma

Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O2/Ar gas

Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas

Inductively coupled plasma reactive ion etching of magnetic tunnel junction stacks using H2O/CH4 mixture

Investigation on etch characteristics of FePt thin films using a H2O/Ar plasma

Influence of O2 Gas on Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH4/O2/Ar Plasma

Effects of Etch Parameters on Etching of CoFeB Thin Films in CH₄/O₂/Ar Mix