Tetsuji Onuki
Nikon
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Publication
Featured researches published by Tetsuji Onuki.
Japanese Journal of Applied Physics | 1992
Sadao Aoki; Taro Ogata; Shuuzou Sudo; Tetsuji Onuki
A high-resolution soft X-ray microscope was constructed using grazing incidence mirrors and a laser-produced plasma source. An Nd-YAG pulse laser (1.064 µm) was focused onto an aluminum target to produce soft X-rays above 4 nm in wavelength. The beam energy of the laser was 1.4 J, with a pulse width of 8 ns. The Wolter type-I mirror was used as an objective mirror and the toroidal mirror as a condenser. The magnification of the objective was 20. A holographic plate was used as a detector. Resolution of about 40 nm was achieved with a single shot.
International Symposium on Optical Fabrication, Testing, and Surface Evaluation | 1992
Tetsuji Onuki; Katsumi Sugisaki; Sadao Aoki
Soft X-ray microscopy, especially using the wavelength region from 2.4nxn to 4.4nxn, is expected in biology. Because the microstructure of live and thick biological specimens containing water can be observed by x-ray absorption difference of protein and water with low damage. The final goal of this work is to produce an imaging x-ray microscope for biological studies.
Japanese Journal of Applied Physics | 1993
Sadao Aoki; Tadayuki Ohchi; Shuuzou Sudo; Kunio Nakajima; Tetsuji Onuki; Katsumi Sugisaki
The observation of X-ray photoelectrons induced by laser-produced plasma X-rays has been made for the very first time. Aluminum plasma X-rays were monochromatized to 5.25 nm (236 eV) using a multilayer mirror and focused to 50 µm×70 µm by the Wolter type-I mirror. Au(4f) and SiO2(2p) photoelectrons were observed with the hemispherical electrostatic electron energy analyzer. The multichannel detector has been used to detect the pulse photoelectrons of the required energy bands individually.
Optical Fabrication and Testing (2002), paper OWD4 | 2002
Takashi Gemma; Shigeru Nakayama; Yuichi Takigawa; Hajime Ichikawa; Takahiro Yamamoto; Yusuke Fukuda; Tetsuji Onuki; Toshiro Umeda
This paper describes null interferometry at 1nm accuracy for testing aspherical surfaces of sub-mm deviation from the best fitting sphere. We have developed the two kinds of null compensators. The one is a “null lens” composed of almost perfect spherical surfaces and homogeneous glass. The other is a “zone plate” manufactured through the lithography process. The results of the two null testing were compared with the results by the ultra-precision CMM (Coordinate Measuring Machine). These totally different measurements differed only by an amount of 1.6nm rms. This result shows the accuracy of our null interferometry is almost 1nm rms.
Archive | 2002
Takashi Gemma; Shigeru Nakayama; Hajime Ichikawa; Takahiro Yamamoto; Yusuke Fukuda; Tetsuji Onuki; T. Umeda
This paper describes null interferometry at 1nm accuracy for testing aspherical surfaces of sub-mm deviation from the best fitting sphere. We have developed the two kinds of null compensators. The one was the null lens composed of almost “perfect” spherical surfaces and homogeneous glass. The other was the zone plate manufactured through the lithography process. The measurement results using these null compensators were compared with the results by the ultra-precision CMM (Coordinate Measuring Machine). These three measurements differed only by an amount of 1.6nm rms. This result proved the accuracy of our null interferometry was almost 1nm rms.
Archive | 1997
Yoshihiko Suzuki; Miyuki Niikura; Tetsuji Onuki
Archive | 1992
Tetsuji Onuki; Masatoshi Suzuki; Hiroyuki Matsushiro
Archive | 1995
Tetsuji Onuki; Masatoshi Suzuki; Toru Fujii; Hiroyuki Matsushiro; Hideaki Ohkubo
Archive | 1998
Shigeru Nakayama; Takashi Genma; Tetsuji Onuki; Masami Ebi; Hajime Ichikawa
Archive | 1992
Tetsuji Onuki; Masatoshi Suzuki; Toru Fujii; Hiroyuki Matsushiro; Hideaki Ohkubo