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Japanese Journal of Applied Physics | 1992

Electrostatic Force and Absorption Current of Alumina Electrostatic Chuck

Toshiya Watanabe; Tetsuo Kitabayashi; Chiaki Nakayama

Electrostatic chucks composed of alumina ceramics doped with 1.3 wt% TiO2 and 3.5 wt% Cr2O3 were fabricated. Evaluations of electrostatic force and absorption charge in various atmospheres were carried out. The electrostatic force in various atmospheres clarified that the electrostatic force is affected not only by the bulk resistance, but also by the surface resistance of the ceramics. Absorption charge measurements revealed that the surface resistance affects the charge distribution of the dielectric layer, and it is deduced that the large electrostatic force of the alumina electrostatic chuck in the vacuum atmosphere is explained by the space charge which concentrates on the dielectric layer and intensity contact potential difference.


Archive | 1990

Method of and apparatus for applying voltage to electrostatic chuck

Toshiya Watanabe; Tetsuo Kitabayashi


Archive | 1989

Dielectric ceramics for electrostatic chucks and method of making them

Toshiya Watanabe; Tetsuo Kitabayashi; Chiaki Nakayama


Archive | 2004

Electrostatic chuck for an electrically insulative substrate, and a method of using same

Tetsuo Kitabayashi; Hiroaki Hori; Takeshi Uchimura; Noriaki Tateno; Koh Fuwa; Ken Maehara


Journal of The Ceramic Society of Japan | 1993

Resistivity and Microstructure of Alumina Ceramics Added with TiO2 Fired in Reducing Atmosphere

Toshiya Watanabe; Toshihiro Aoshima; Tetsuo Kitabayashi; Chiaki Nakayama


Journal of The Ceramic Society of Japan | 1992

Effect of Additives on the Electrostatic Force of Alumina Electrostatic Chucks

Toshiya Watanabe; Tetsuo Kitabayashi


Archive | 2000

Electrostatic chuck and processing apparatus for insulative substrate

Tetsuo Kitabayashi; Hiroaki Hori; Takeshi Uchimura; Noriaki Tateno; Koh Fuwa; Ken Maehira


Archive | 1999

Electrostatic chuck and treatment device

Ko Fuwa; Hiroaki Hori; Tetsuo Kitabayashi; Ken Maehira; Noriaki Tateno; Kenji Uchimura; 耕 不破; 健志 内村; 謙 前平; 徹夫 北林; 裕明 堀; 範昭 建野


Archive | 2000

Electrostatic chuck and treating device

Tetsuo Kitabayashi; Hiroaki Hori; Takeshi Uchimura; Noriaki Tateno; Koh Fuwa; Ken Maehira


Archive | 2003

Electrostatic chucking method of glass substrate and electrostatic chuck

Tetsuo Kitabayashi; Shunpei Kondo; 徹夫 北林; 俊平 近藤

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