Tetsuyoshi Wada | Researchain

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Archive | 1985

Method of controlling deposition amount distribution in a vacuum deposition plating

Yoshio Shimozato; Tetsuyoshi Wada; Kenichi Yanagi; Mitsuo Kato; Heizaburo Furukawa; Kanji Wake; Arihiko Morita; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1985

Method and apparatus for vacuum deposition plating

Heizaburo Furukawa; Kanji Wake; Yoshio Shimozato; Kenichi Yanagi; Mitsuo Katoh; Tetsuyoshi Wada; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1985

Method of rapidly changing deposition amount in a continuous vacuum deposition process

Yoshio Shimozato; Tetsuyoshi Wada; Kenichi Yanagi; Mitsuo Kato; Heizaburo Furukawa; Kanji Wake; Arihiko Morita; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1985

Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow

Yoshio Shimozato; Tetsuyoshi Wada; Kenichi Yanagi; Mitsuo Kato; Heizaburo Furukawa; Kanji Wake; Arihiko Morita; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1984

Vacuum vapor deposition system

Kenichi Yanagi; Toshio Taguchi; Tetsuyoshi Wada; Heisaburo Furukawa; Kanji Wake

Archive | 1985

Method for vacuum deposition plating steel strip

Heizaburo Furukawa; Kanji Wake; Yoshio Shimozato; Kenichi Yanagi; Mitsuo Katoh; Tetsuyoshi Wada; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1985

Vacuum evaporation coating equipment

Heisaburo Furukawa; Kanji Wake; Yoshio Shimozato; Kenichi Yanagi; Mitsuo Kato; Tetsuyoshi Wada; Norio Tsukiji; Takuya Aiko; Toshiharu Kittaka; Yasuji Nakanishi

Archive | 1985

VACUUM EVAPORATION EQUIPMENT

Heisaburo Furukawa; Kanji Wake; Yoshio Shimozato; Kenichi Yanagi; Mitsuo Kato; Tetsuyoshi Wada; Norio C; O Hanshin R D Laboratories Tsukiji; Takuya C; O Hanshin R D Laboratories Aiko; Toshiharu C; O Hanshin R D Laboratories Kittaka; Yasuji C; O Hanshin R D Laboratories Nakanishi

Archive | 1985

Vorrichtung zur bedampfung. Apparatus for vapor deposition.

Heisaburo Furukawa; Kanji Wake; Yoshio Shimozato; Kenichi Yanagi; Mitsuo Hiroshima Technical Inst. Kato; Tetsuyoshi Wada; Norio C; O Hanshin R D Laboratorie Tsukiji; Takuya C; O Hanshin R D Laboratori Aiko; Toshiharu C; O Hanshin R D Laborat Kittaka; Yasuji C; O Hanshin R D Laboratori Sakai-Shi Osaka Jp Nakanishi

Archive | 1985

Kontinuierliche Vorrichtung zur Vakuumbedampfung mit Platte zur Regelung der Breite des Dampfstrahls

Kenichi Yanagi; Mitsui Kato; Tetsuyoshi Wada; Heizaburo Hiroshimashipyard Eng Works Furukawa; Kanji Wake; Arihiko C; O Nisshin R D Laboratories Morita; Norio C; O Nisshin R D Laboratories Tsukiji; Takuya C; O Nisshin R D Laboratories Aiko; Toshiharu C; O Nisshin R D Laboratories Kittaka; Yasuji C; O Nisshin R D Laboratories Nakanishi

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