Th. Gruber

ZnMgO epilayers and ZnO-ZnMgO quantum wells for optoelectronic applications in the blue and UV spectral region

We have investigated the properties of ZnMgO epilayers and ZnO–ZnMgO quantum well structures grown by metalorganic vapor-phase epitaxy. A well-controlled incorporation of magnesium, x⩽0.10, could be confirmed resulting in a blueshift of the photoluminescence emission wavelength of the Zn1−xMgxO layers up to 200meV. Using ZnMgO as barrier material, ZnO–ZnMgO quantum well structures with different well widths have then been fabricated. The confinement effect in the ZnO quantum wells leads to the expected increase of the corresponding quantum well emission energy with decreasing well width. A comparison to calculations also suggests a further enhancement of the exciton binding energy in the quantum wells of up to 90meV.

Optical and structural analysis of ZnCdO layers grown by metalorganic vapor-phase epitaxy

The development of ZnO-based semiconductor devices requires band gap engineering. Ternary Zn1−xCdxO allows reduction of the band gap relative to ZnO, which would be necessary for devices emitting visible light. We have analyzed the structural and optical properties of Zn1−xCdxO layers grown by metalorganic vapor-phase epitaxy. A narrowing of the fundamental band gap of up to 300 meV has been observed, while introducing a lattice mismatch of only 0.5% with respect to binary ZnO. Photoluminescence, high-resolution x-ray diffraction, and spatially resolved cathodoluminescence measurements revealed a lateral distribution of two different cadmium concentrations within the Zn1−xCdxO layers.

Optical investigations on the annealing behavior of gallium- and nitrogen-implanted ZnO

Gallium and nitrogen ions have been implanted into ZnO crystals and metal organic vapor phase epitaxy grown ZnO layers. Postimplantation annealing behavior in the temperature range between 200 and 900 °C has been studied by means of Raman scattering and low-temperature photoluminescence. The temperature for healing of the implantation-induced defects was found to be 800 °C. Implanted gallium acts as donor with a donor binding energy ED of 53 meV, thus allowing the control of n-type doping in ZnO. From photoluminescence measurements of the donor-acceptor pair transition of a series of nitrogen-implanted ZnO samples we estimate the binding energy EA of the nitrogen acceptor between 163 and 196 meV. Electrical characterization of nitrogen-implanted samples shows a behavior ranging from low n-type to highly compensated. But no unambiguous and reproducible type conversion could be achieved.

Electron spin manipulation using semimagnetic resonant tunneling diodes

One major challenge for the development of spintronic devices is the control of the spin polarization of an electron current. We propose and demonstrate the use of a BeTe/Zn1−xSe/BeTe double barrier resonant tunneling diode for the injection of a spin-polarized electron current into GaAs and the manipulation of the spin orientation of the injected carriers via an external voltage. A spin polarization of up to 80% can be observed with a semimagnetic layer of only 3.5 nm thickness. By changing the resonance condition via the external voltage, the degree of spin polarization can be varied, though a complete spin switching has not yet been accomplished.

Origin and consequences of a high stacking fault density in epitaxial ZnO layers

Transmission electron microscopy was applied to study ZnO grown by metalorganic vapor phase epitaxy on Al2O3(0001) substrates. The defect structure of the material is dominated by an extraordinary high density of small stacking faults with extensions between 5 and 25 nm which induce a bright small-scale speckle contrast under weak-beam imaging conditions. The stacking faults are terminated by Frank partial dislocations with Burgers vectors of the type 1/6 〈2203〉. The precipitation of interstitial atoms is the most likely process for the generation of the stacking faults, which are characterized by an additional (0002) plane. The high stacking fault density can be considered as an indicator for high point defect concentrations, which are expected to aggravate the control of the electrical conductivity.

Influences of biaxial strains on the vibrational and exciton energies in Zno

We have investigated the structural, optical, and vibrational properties of strained heteroepitaxial ZnO layers by high resolution x-ray diffraction, reflectivity, and Raman measurements. The ZnO layers were grown by metalorganic vapor phase epitaxy on sapphire substrates under varying growth conditions. A Poisson number of μ=0.303 and phonon deformation-potential parameters of a=−690 cm−1, b=−940 cm−1 for the high-energy E2 optical phonon mode have been determined. The shift of the excitonic resonances due to the strain in the layers agrees well with the experimentally determined Poisson ratio using the deformation-potentials D1–D4 determined by Wrzesinski and Frohlich [Phys. Rev. B 56, 13087 (1997)].

Analysis of ZnO and ZnMgO nanopillars grown by self-organization

In this contribution we analyse the structural and optical properties of ZnO as well as ZnMgO nanopillars grown catalyst-free by metalorganic vapour-phase epitaxy. The nanostructures were grown directly onto different substrate materials with various orientations. The nanopillars deposited on a-plane sapphire show the best vertical c-axis alignment and have a typical diameter of about 50 nm and a height of several micrometres, depending on growth time. We achieved well ordered, almost completely c-axis oriented pillars, as confirmed by scanning electron microscopy and high resolution x-ray diffraction. Photoluminescence measurements revealed very narrow donor-bound exciton emission lines with half widths as small as 0.5 meV. In order to investigate the possibility of a combination of band gap engineering and nanopillar growth, ZnMgO nanopillars were also grown. The Mg incorporation was confirmed by photoluminescence measurements and a blue shift of the band gap of up to 170 meV could be achieved for the nanopillars with the highest Mg concentration.

MOCVD Growth of ZnO for Optoelectronic Applications

In this paper we report on the metal-organic chemical vapour deposition of ZnO layers. We focus on heteroepitaxial growth on c-plane Al 2 O 3 and the influence of the VI/II ratio during growth on the properties of the layers. The layer quality has been investigated by HRXRD, PL and reflectivity measurements. Under optimized growth conditions the photoluminescence is dominated by strong near band edge emission lines with half widths below 4 meV and the excitonic signals are clearly visible in reflectivity measurements. Hall effect measurements indicate an n-type background doping in the 10 17 cm -3 range, and mobilities of more than 100 cm 2 /Vs can be reached. Moreover, a post-growth annealing step is found to improve the quality of the layers grown under suboptimal conditions. The problem of strain will be addressed and a tensile strain can be confirmed in the heteroepitaxial ZnO layers.

Magnetoresistance in epitaxially grown degenerate ZnO thin films

The magnetoresistance of high-quality epitaxial doped ZnO(:Ga) thin films with various electron concentrations ranging from 3.2×1018 to 1.3×1020cm−3 has been measured. All samples investigated exhibit a negative magnetoresistance at low magnetic fields. Its magnitude systematically depends on carrier concentration and temperature. Low-doped samples switch the sign of the magnetoresistance and the conventional positive component dominates at high fields, whereas highly doped degenerate samples only show a negative component up to fields of 14.5 T. Therefore, the data are analyzed as the sum of a positive and negative contribution to the magnetoresistance applying a semiempirical expression to describe the observed behavior. The model takes into account third-order s–d exchange Hamiltonians describing the negative part and a two-band model for the positive contribution. Least-squares fits to the data are presented. Theory and experiment are in excellent agreement.

MOCVD Growth of ZnO on Different Substrate Materials

ZnO layers have been grown by metal-organic chemical vapor deposition using diethylzinc and iso-propanol. Heteroepitaxial growth on c-plane sapphire and GaN templates as well as homoepitaxial growth on bulk ZnO substrates has been carried out at a growth rate of 0.95 μm/h. The photoluminescence at 5 K of all samples shows strong near band edge emission with line widths of 5-12 meV and phonon replicas can be identified, indicating the good optical quality. The full widths at half maximum of the θ-2θ scans are between 100 and 270 arcsec depending on the substrate. The results suggest that the substrate material is limiting the quality of the ZnO layers.