Thomas B. Brust
Eastman Kodak Company
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Publication
Featured researches published by Thomas B. Brust.
Advances in Resist Technology and Processing V | 1988
William C. McColgin; Robert C. Daly; Joseph Jech; Thomas B. Brust
A new silylated resist process has been developed that provides the advantages of trilayer photoresist processing in a simpler bilayer format. In this new process, silicon for oxygen plasma etch resistance is added to a conventional photoresist layer after it has been exposed and developed. This silylated resist image provides an etch mask for 02 RIE etching of an underlying organic planarizing layer with 15:1 selectivity, vertical profiles, and high resolution. The process is positive-working, uses conventional materials, and improves the thermal stability of the resist image.
Archive | 1989
William C. McColgin; Thomas B. Brust; Robert C. Daly; Joseph Jech; Robert D. Lindholm
Archive | 2008
Karin Topfer; Thomas B. Brust; Brent Keller; Elaine W. Jin
Archive | 1993
Gary Lawrence House; Thomas B. Brust; Debra L. Hartsell; Donald Lee Black; Michael G. Antoniades; Jerzy A. Budz; Yun C. Chang; Roger Lok; Sherrill Austin Puckett; Allen Keh-Chang Tsaur
Archive | 1993
Thomas B. Brust; Mark R. Mis
Archive | 2008
James W. Blease; Thomas B. Brust; Hujuan D. Chen; Gang C. Han-Adebekun; Mark Edward Irving; David Thomas Southby; David Scott Uerz
Archive | 1993
Richard P. Szajewski; Gary Lawrence House; Thomas B. Brust; Debra L. Hartsell; Donald Lee Black; Anne E. Bohan; James Parker Merrill
Archive | 2008
Thomas B. Brust; Michael J. Carmody; Robert H. Fehnel; Gary Lawrence House; Mark Edward Irving; Yongcai Wang; Paul Daniel Yacobucci
Archive | 2008
Gary Lawrence House; Thomas B. Brust; Yongcai Wang
Archive | 1992
Allan Francis Sowinski; George Fu Liang Wu; Thomas B. Brust; James Thomas Kofron; Gary Lawrence House
